Inventor
MOCHIJI KOZO
JP19 patents
Patents
19 patentsUS5527731AJun 18, 1996
Surface treating method and apparatus therefor
HITACHI LTD58 citations96
US5485497AJan 16, 1996
Optical element and projection exposure apparatus employing the same
HITACHI LTD25 citations92
US5372916ADec 13, 1994
X-ray exposure method with an X-ray mask comprising phase shifter sidewalls
HITACHI LTD44 citations92
US5305364AApr 19, 1994
Projection type X-ray lithography apparatus
HITACHI LTD38 citations92
US4315984AFeb 16, 1982
Method of producing a semiconductor device
HITACHI LTD43 citations92
US5714757AFeb 3, 1998
Surface analyzing method and its apparatus
HITACHI LTD32 citations91
US4670650AJun 2, 1987
Method of measuring resist pattern
HITACHI LTD26 citations91
US4403151ASep 6, 1983
Method of forming patterns
HITACHI LTD26 citations79
US4719161AJan 12, 1988
Mask for X-ray lithography and process for producing the same
HITACHI LTD7 citations74
US4981771AJan 1, 1991
Pattern fabricating method
HITACHI LTD7 citations73
US4788698ANov 29, 1988
X-ray exposure system
HITACHI LTD16 citations73
US4514857AApr 30, 1985
X-Ray lithographic system
HITACHI LTD9 citations73
US4307176ADec 22, 1981
Method of forming a pattern
HITACHI LTD11 citations73
US5017458AMay 21, 1991
Method for production of graft copolymer, pattern replication method, and base polymer and resist for graft copolymerization
HITACHI LTD13 citations72
US4960676AOct 2, 1990
Method for forming pattern by using graft copolymerization
HITACHI LTD7 citations72
US4954424ASep 4, 1990
Pattern fabrication by radiation-induced graft copolymerization
HITACHI LTD4 citations62
US4599737AJul 8, 1986
X-ray mask with Ni pattern
HITACHI LTD5 citations62
US5177773AJan 5, 1993
X-ray mask and method for producing same
HITACHI LTD2 citations61
US4701940AOct 20, 1987
Linearly polarized X-ray patterning process
HITACHI LTD6 citations58