Inventor
AGARWAL VISHNU K
US138 patents
Patents
50 patentsUS7238616B2Jul 3, 2007
Photo-assisted method for semiconductor fabrication
MICRON TECHNOLOGY INC468 citations99
US6930041B2Aug 16, 2005
Photo-assisted method for semiconductor fabrication
MICRON TECHNOLOGY INC470 citations99
US6670256B2Dec 30, 2003
Metal oxynitride capacitor barrier layer
MICRON TECHNOLOGY INC121 citations99
US6667502B1Dec 23, 2003
Structurally-stabilized capacitors and method of making of same
MICRON TECHNOLOGY INC164 citations99
US6576564B2Jun 10, 2003
Photo-assisted remote plasma apparatus and method
MICRON TECHNOLOGY INC478 citations99
US6417537B1Jul 9, 2002
Metal oxynitride capacitor barrier layer
MICRON TECHNOLOGY INC117 citations99
US6365453B1Apr 2, 2002
Method and structure for reducing contact aspect ratios
MICRON TECHNOLOGY INC86 citations99
US6323046B1Nov 27, 2001
Method and apparatus for endpointing a chemical-mechanical planarization process
MICRON TECHNOLOGY INC98 citations99
US6297527B1Oct 2, 2001
Multilayer electrode for ferroelectric and high dielectric constant capacitors
MICRON TECHNOLOGY INC97 citations99
US6206759B1Mar 27, 2001
Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines
MICRON TECHNOLOGY INC146 citations99
US6165834ADec 26, 2000
Method of forming capacitors, method of processing dielectric layers, method of forming a DRAM cell
MICRON TECHNOLOGY INC199 citations99
US6465828B2Oct 15, 2002
Semiconductor container structure with diffusion barrier
MICRON TECHNOLOGY INC91 citations98
US6198144B1Mar 6, 2001
Passivation of sidewalls of a word line stack
MICRON TECHNOLOGY INC97 citations98
US6596583B2Jul 22, 2003
Methods for forming and integrated circuit structures containing ruthenium and tungsten containing layers
MICRON TECHNOLOGY INC96 citations97
US7359607B2Apr 15, 2008
Waveguide for thermo optic device
MICRON TECHNOLOGY INC34 citations96
US7006746B2Feb 28, 2006
Waveguide for thermo optic device
MICRON TECHNOLOGY INC38 citations96
US6911381B2Jun 28, 2005
Boron incorporated diffusion barrier material
MICRON TECHNOLOGY INC37 citations96
US6900497B2May 31, 2005
Integrated circuit with a capacitor comprising an electrode
MICRON TECHNOLOGY INC43 citations96
US6784504B2Aug 31, 2004
Methods for forming rough ruthenium-containing layers and structures/methods using same
MICRON TECHNOLOGY INC43 citations96
US6777739B2Aug 17, 2004
Multilayer electrode for a ferroelectric capacitor
MICRON TECHNOLOGY INC42 citations96
US6746916B2Jun 8, 2004
Method for forming a multilayer electrode for a ferroelectric capacitor
MICRON TECHNOLOGY INC48 citations96
US6744093B2Jun 1, 2004
Multilayer electrode for a ferroelectric capacitor
MICRON TECHNOLOGY INC42 citations96
US6720609B2Apr 13, 2004
Structure for reducing contact aspect ratios
MICRON TECHNOLOGY INC40 citations96
US6488575B2Dec 3, 2002
Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines
MICRON TECHNOLOGY INC39 citations96
US6472264B1Oct 29, 2002
Device and method for protecting against oxidation of a conductive layer in said device
MICRON TECHNOLOGY INC24 citations96
US6468854B1Oct 22, 2002
Device and method for protecting against oxidation of a conductive layer in said device
MICRON TECHNOLOGY INC18 citations96
US6429127B1Aug 6, 2002
Methods for forming rough ruthenium-containing layers and structures/methods using same
MICRON TECHNOLOGY INC45 citations96
US6361832B1Mar 26, 2002
Polishing pads and planarizing machines for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods for making and using such pads and machines
MICRON TECHNOLOGY INC72 citations96
US6306754B1Oct 23, 2001
Method for forming wiring with extremely low parasitic capacitance
MICRON TECHNOLOGY INC57 citations96
US6218256B1Apr 17, 2001
Electrode and capacitor structure for a semiconductor device and associated methods of manufacture
MICRON TECHNOLOGY INC56 citations96
US6201276B1Mar 13, 2001
Method of fabricating semiconductor devices utilizing in situ passivation of dielectric thin films
MICRON TECHNOLOGY INC62 citations96
US6156638ADec 5, 2000
Integrated circuitry and method of restricting diffusion from one material to another
MICRON TECHNOLOGY INC53 citations96
US6095085AAug 1, 2000
Photo-assisted remote plasma apparatus and method
MICRON TECHNOLOGY INC60 citations96
US7282756B2Oct 16, 2007
Structurally-stabilized capacitors and method of making of same
MICRON TECHNOLOGY INC29 citations93
US7268072B2Sep 11, 2007
Method and structure for reducing contact aspect ratios
MICRON TECHNOLOGY INC10 citations93
US7049153B2May 23, 2006
Polymer-based ferroelectric memory
MICRON TECHNOLOGY INC17 citations93
US7005695B1Feb 28, 2006
Integrated circuitry including a capacitor with an amorphous and a crystalline high K capacitor dielectric region
MICRON TECHNOLOGY INC19 citations93
US6986700B2Jan 17, 2006
Apparatuses for in-situ optical endpointing on web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies
MICRON TECHNOLOGY INC29 citations93
US6953721B2Oct 11, 2005
Methods of forming a capacitor with an amorphous and a crystalline high K capacitor dielectric region
MICRON TECHNOLOGY INC25 citations93
US6875679B2Apr 5, 2005
Etch stop layer in poly-metal structures
MICRON TECHNOLOGY INC15 citations93
US6776871B2Aug 17, 2004
Method and apparatus for endpointing a chemical-mechanical planarization process
MICRON TECHNOLOGY INC15 citations93
US6750500B1Jun 15, 2004
Capacitor electrode for integrating high K materials
MICRON TECHNOLOGY INC19 citations93
US6699777B2Mar 2, 2004
Etch stop layer in poly-metal structures
MICRON TECHNOLOGY INC19 citations93
US6670238B2Dec 30, 2003
Method and structure for reducing contact aspect ratios
MICRON TECHNOLOGY INC20 citations93
US6635939B2Oct 21, 2003
Boron incorporated diffusion barrier material
MICRON TECHNOLOGY INC25 citations93
US6630391B2Oct 7, 2003
Boron incorporated diffusion barrier material
MICRON TECHNOLOGY INC27 citations93
US6612901B1Sep 2, 2003
Apparatus for in-situ optical endpointing of web-format planarizing machines in mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies
MICRON TECHNOLOGY INC34 citations93
US6607975B1Aug 19, 2003
Device and method for protecting against oxidation of a conductive layer in said device
MICRON TECHNOLOGY INC17 citations93
US6580115B2Jun 17, 2003
Capacitor electrode for integrating high k materials
MICRON TECHNOLOGY INC19 citations93
US6562182B2May 13, 2003
Method and apparatus for endpointing a chemical-mechanical planarization process
MICRON TECHNOLOGY INC19 citations93
Showing the top 50 of 138 patents by PatentIndex Score.