Inventor
GOTO HARUHIRO
US2 patents
Patents
2 patentsUS5607602AMar 4, 1997
High-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gas
APPLIED KOMATSU TECHNOLOGY INC63 citations94
US5895549AApr 20, 1999
Method and apparatus for etching film layers on large substrates
APPLIED KOMATSU TECHNOLOGY INC62 citations91