Inventor
KUO SO WEIN
TW10 patents
Patents
10 patentsUS5872061AFeb 16, 1999
Plasma etch method for forming residue free fluorine containing plasma etched layers
TAIWAN SEMICONDUCTOR MFG121 citations97
US6063695AMay 16, 2000
Simplified process for the fabrication of deep clear laser marks using a photoresist mask
TAIWAN SEMICONDUCTOR MFG57 citations94
US6287926B1Sep 11, 2001
Self aligned channel implant, elevated S/D process by gate electrode damascene
TAIWAN SEMICONDUCTOR MFG36 citations92
US5709755AJan 20, 1998
Method for CMP cleaning improvement
TAIWAN SEMICONDUCTOR MFG27 citations92
US6228780B1May 8, 2001
Non-shrinkable passivation scheme for metal em improvement
TAIWAN SEMICONDUCTOR MFG16 citations83
US6583017B2Jun 24, 2003
Self aligned channel implant, elevated S/D process by gate electrode damascene
TAIWAN SEMICONDUCTOR MFG8 citations73
US5661084AAug 26, 1997
Method for contact profile improvement
TAIWAN SEMICONDUCTOR MFG8 citations73
US5854137ADec 29, 1998
Method for reduction of polycide residues
TAIWAN SEMICONDUCTOR MFG12 citations72
US6790756B2Sep 14, 2004
Self aligned channel implant, elevated S/D process by gate electrode damascene
TAIWAN SEMICONDUCTOR MFG2 citations62
US6468918B1Oct 22, 2002
In situ photoresist hot bake in loading chamber of dry etch
TAIWAN SEMICONDUCTOR MFG5 citations61