Inventor
KAMIYA SABURO
JP21 patents
Patents
21 patentsUS6897963B1May 24, 2005
Stage device and exposure apparatus
NIKON CORP481 citations99
US5719704AFeb 17, 1998
Projection exposure apparatus
NIKON CORP111 citations99
US5151749ASep 29, 1992
Method of and apparatus for measuring coordinate position and positioning an object
NIKON CORP149 citations99
US5790253AAug 4, 1998
Method and apparatus for correcting linearity errors of a moving mirror and stage
NIKON CORP109 citations98
US6377336B1Apr 23, 2002
Projection exposure apparatus
NIKON CORP39 citations96
US6002987ADec 14, 1999
Methods to control the environment and exposure apparatus
NIKON CORP76 citations96
US5563683AOct 8, 1996
Substrate holder
NIKON CORP71 citations96
US5550633AAug 27, 1996
Optical measuring apparatus having a partitioning wall for dividing gas flow in an environmental chamber
NIKON CORP58 citations96
US5272501ADec 21, 1993
Projection exposure apparatus
NIKON CORP89 citations96
US4989031AJan 29, 1991
Projection exposure apparatus
NIKON CORP59 citations96
US6741358B1May 25, 2004
Exposure apparatus and device production method in which position of reference plate provided on substrate stage is measured
NIKON CORP24 citations92
US6714278B2Mar 30, 2004
Exposure apparatus
NIKON CORP19 citations92
US4902900AFeb 20, 1990
Device for detecting the levelling of the surface of an object
NIKON CORP46 citations92
US4853745AAug 1, 1989
Exposure apparatus
NIKON CORP43 citations92
US4820899AApr 11, 1989
Laser beam working system
NIKON CORP51 citations92
US5392120AFeb 21, 1995
Dual interferometer measuring system including a wavelength correction resulting from a variation in the refractive index
NIKON CORP10 citations74
US6784972B2Aug 31, 2004
Exposure apparatus, device manufacturing method and environmental control method of exposure apparatus
NIKON CORP10 citations68
US5018848AMay 28, 1991
Laser beam transmitting apparatus
NIKON CORP6 citations63
US7471372B2Dec 30, 2008
Exposure apparatus and production method of device using the same
NIKON CORP0 citations52
US7283200B2Oct 16, 2007
System and method for measuring displacement of a stage
NIKON CORP0 citations51
US7876452B2Jan 25, 2011
Interferometric position-measuring devices and methods
NIKON CORP0 citations41