Inventor
FORSTNER HALI J L
US3 patents
Patents
3 patentsUS6042654AMar 28, 2000
Method of cleaning CVD cold-wall chamber and exhaust lines
APPLIED MATERIALS INC134 citations95
US6368567B2Apr 9, 2002
Point-of-use exhaust by-product reactor
APPLIED MATERIALS INC19 citations91
US7642171B2Jan 5, 2010
Multi-step anneal of thin films for film densification and improved gap-fill
APPLIED MATERIALS INC15 citations83