Inventor

NAKANO KAICHIRO

JP46 patents

⚠️ This page may combine multiple inventors who share the name “NAKANO KAICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NAKANO KAICHIRO

NEC CORP

Photosensitive resin and method for patterning by use of the same

Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

Photosensitive resin and method for patterning by use of the same

Photosensitive resin composition useful as resist for deep UV lithography containing sulfonium salts

Alkylsulfonium salts and photoresist compositions containing the same

Sulfonium salt compound, photoresist composition and method for patterning by employing same

Photosensitive resin composition and patterning method using the same

Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same

Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same

Negative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devices

Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same

Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask

Sulfonium salts having bridged cyclic alkyl group useful as resist for deep UV lithography

Polymer having silicon atoms and sulfonium salt units and photoresist compositions containing the same

Monomer having vinyl group, polymer thereof and photosensitive resin including those

Alkylsulfonium salts and photoresist compositions containing the same

Photoresist and compounds for composing the photoresist

Photoresist and monomer and polymer for composing the photoresist

Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method

Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer

Sulfonium salt compound and resist composition and pattern forming method using the same

(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition

Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same

(Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the composition

Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask

(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition

Photolytic polymer and photoresist composition

Photoresist and compounds for composing the photoresist

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide

Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same

Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions

Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition

Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer

Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern

Unsaturated monomers, polymers, chemically-amplified resist composition, and process of pattern formation

Resist resin, chemical amplification type resist, and method of forming of pattern with the same

Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition

MAEDA KATSUMI

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide

NEC CORPROATION

Structure and method for mounting LSI package onto photoelectric wiring board, information processing apparatus, optical interface, and photoelectric wiring board

OHMURA MASAKI

Ferrule, and method of producing an optical waveguide connector, and optical waveguide connector which use the ferrule

NAKAHARA KENTARO

Electricity storage device

KOREEDA YUICHI

Optical connector