Inventor

MAEDA KATSUMI

JP74 patents

⚠️ This page may combine multiple inventors who share the name “MAEDA KATSUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MAEDA KATSUMI

NEC CORP

Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

Alkylsulfonium salts and photoresist compositions containing the same

Sulfonium salt compound, photoresist composition and method for patterning by employing same

Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same

Photosensitive resin composition and patterning method using the same

Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same

Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same

Negative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devices

Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same

Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask

Polymer having silicon atoms and sulfonium salt units and photoresist compositions containing the same

Alkylsulfonium salts and photoresist compositions containing the same

Photoresist and compounds for composing the photoresist

Photoresist and monomer and polymer for composing the photoresist

Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer

Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method

Sulfonium salt compound and resist composition and pattern forming method using the same

(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition

Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same

(Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the composition

Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask

(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition

Photolytic polymer and photoresist composition

Photoresist and compounds for composing the photoresist

Lithium ion secondary battery

Detection device, assistance device and assistance method

Reduced graphene oxide-graphite composite material, method for producing same, and lithium ion secondary battery using same

Reduced graphene-based material

Graphite-based material for lithium ion secondary batteries and method for producing the same, and negative electrode and lithium ion secondary battery

(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it

Photosensitive resin composition for optical waveguide formation, optical waveguide and method for producing optical waveguide

Transistor using organic material having a bridged cyclic hydrocarbon lactone structure and process for producing the same

Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same

Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions

Fluorine-containing phenylmaleimide derivative, polymer, chemically amplified resist composition, and method for pattern formation using the composition

Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer

Lithium ion secondary battery

Carbon conductive additives for lithium ion battery

STAR MFG CO

One revolution clutch assembly using gears

Print head assembly of wire dot matrix printer

Wire printer

ECOLAB INC

Controlled release dishwasher detergent dispenser

MORI KENTARO

Semiconductor device and manufacturing method thereof

MINOLTA CAMERA KK

Developing device with retractable cutoff member

DYNIC CORP

Bookbinding device and method

STANLEY ELECTRIC CO LTD

Manufacture method for ZnO based compound semiconductor crystal and ZnO based compound semiconductor substrate

STANLEY ELECTRIC CO LTD TOKYO

Manufacture method for ZnO based compound semiconductor crystal and ZnO based compound semiconductor substrate

KIKUCHI KATSUMI

Semiconductor device and method for manufacturing the same