Inventor
HASEGAWA ETSUO
JP74 patents
⚠️ This page may combine multiple inventors who share the name “HASEGAWA ETSUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NEC CORP
37 patentsUS5738975AApr 14, 1998
Photosensitive resin and method for patterning by use of the same
NEC CORP149 citations99
US5994025ANov 30, 1999
Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist
NEC CORP93 citations97
US7432035B2Oct 7, 2008
(Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
NEC CORP54 citations96
US7186495B2Mar 6, 2007
(Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
NEC CORP46 citations96
US5866304AFeb 2, 1999
Photosensitive resin and method for patterning by use of the same
NEC CORP61 citations96
US5691111ANov 25, 1997
Photosensitive resin composition useful as resist for deep UV lithography containing sulfonium salts
NEC CORP47 citations96
US5635332AJun 3, 1997
Alkylsulfonium salts and photoresist compositions containing the same
NEC CORP63 citations96
US6528232B1Mar 4, 2003
Sulfonium salt compound, photoresist composition and method for patterning by employing same
NEC CORP28 citations93
US6437052B1Aug 20, 2002
Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same
NEC CORP29 citations93
US6352813B2Mar 5, 2002
Photosensitive resin composition and patterning method using the same
NEC CORP22 citations93
US6146806ANov 14, 2000
Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same
NEC CORP36 citations93
US6140010AOct 31, 2000
Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same
NEC CORP27 citations93
US6106998AAug 22, 2000
Negative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devices
NEC CORP44 citations93
US6074801AJun 13, 2000
Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same
NEC CORP41 citations93
US6030747AFeb 29, 2000
Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask
NEC CORP29 citations93
US5756850AMay 26, 1998
Sulfonium salts having bridged cyclic alkyl group useful as resist for deep UV lithography
NEC CORP18 citations93
US5747622AMay 5, 1998
Polymer having silicon atoms and sulfonium salt units and photoresist compositions containing the same
NEC CORP21 citations93
US5621019AApr 15, 1997
Monomer having vinyl group, polymer thereof and photosensitive resin including those
NEC CORP37 citations93
US5585507ADec 17, 1996
Alkylsulfonium salts and photoresist compositions containing the same
NEC CORP35 citations93
US6866964B2Mar 15, 2005
Secondary battery
NEC CORP19 citations92
US6503656B1Jan 7, 2003
Method for production of battery
NEC CORP22 citations92
US6235433B1May 22, 2001
High molecular gel electrolyte and secondary battery using the same
NEC CORP41 citations92
US5770346AJun 23, 1998
Photoresist and compounds for composing the photoresist
NEC CORP18 citations92
US5665518ASep 9, 1997
Photoresist and monomer and polymer for composing the photoresist
NEC CORP36 citations92
US5586001ADec 17, 1996
Solid electrolyte capacitor using polyaniline doped with disulfonic acid
NEC CORP47 citations92
US5674576AOct 7, 1997
Liquid crystalline optical device operable at a low drive voltage
NEC CORP45 citations91
US7642011B2Jan 5, 2010
Secondary battery with a radical compound active material
NEC CORP8 citations84
US6638685B2Oct 28, 2003
Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method
NEC CORP9 citations74
US6639358B2Oct 28, 2003
Organic electroluminescent device with buried lower elecrodes and method for manufacturing the same
NEC CORP9 citations74
US6602647B2Aug 5, 2003
Sulfonium salt compound and resist composition and pattern forming method using the same
NEC CORP11 citations74
US6559337B2May 6, 2003
(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition
NEC CORP10 citations74
US6469197B1Oct 22, 2002
Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same
NEC CORP8 citations74
US6391529B2May 21, 2002
(Meth)acrylate, polymer photoresist composition, and pattern forming process making use of the composition
NEC CORP12 citations74
US6287746B1Sep 11, 2001
Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask
NEC CORP12 citations74
US6248499B1Jun 19, 2001
(Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition
NEC CORP6 citations74
US5439990AAug 8, 1995
Photolytic polymer and photoresist composition
NEC CORP8 citations74
US6322908B1Nov 27, 2001
Organic electroluminescent device
NEC CORP13 citations73
DENSO CORP
9 patentsUS6827139B2Dec 7, 2004
Heat exchanger for exchanging heat between internal fluid and external fluid and manufacturing method thereof
DENSO CORP63 citations96
US7448436B2Nov 11, 2008
Heat exchanger
DENSO CORP22 citations92
US7044208B2May 16, 2006
Heat exchanger
DENSO CORP20 citations92
US7849915B2Dec 14, 2010
Heat exchange tube having multiple fluid paths
DENSO CORP8 citations84
US7604044B2Oct 20, 2009
Heat exchanger
DENSO CORP11 citations84
US7571761B2Aug 11, 2009
Heat exchanger
DENSO CORP16 citations84
US7367203B2May 6, 2008
Refrigerant evaporator
DENSO CORP16 citations84
US6923019B2Aug 2, 2005
Heat exchanger
DENSO CORP10 citations73
US6907922B2Jun 21, 2005
Heat exchanger
DENSO CORP11 citations73
NIPPON DENSO CO
2 patentsYAMADA ATSUSHI
1 patentNIPPON OILS & FATS CO LTD
1 patentShowing the top 50 of 74 patents by PatentIndex Score.