Inventor
SOEDA SHINYA
JP12 patents
⚠️ This page may combine multiple inventors who share the name “SOEDA SHINYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
9 patentsUS6323560B1Nov 27, 2001
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photo mask and method of exposure thereof
MITSUBISHI ELECTRIC CORP63 citations95
US6388295B1May 14, 2002
Semiconductor device and method of manufacturing the same
MITSUBISHI ELECTRIC CORP21 citations92
US6355387B1Mar 12, 2002
Method of making a mask pattern
MITSUBISHI ELECTRIC CORP38 citations92
US6218235B1Apr 17, 2001
Method of manufacturing a DRAM and logic device
MITSUBISHI ELECTRIC CORP31 citations90
US5892291AApr 6, 1999
Registration accuracy measurement mark
MITSUBISHI ELECTRIC CORP15 citations81
US6331462B1Dec 18, 2001
Manufacturing method of a semiconductor device for desired circuit patterns
MITSUBISHI ELECTRIC CORP10 citations73
US6068952AMay 30, 2000
Registration accuracy measurement mark, method of repairing defect of the mark, photomask having the mark, method of manufacturing the photomask and method of exposure thereof
MITSUBISHI ELECTRIC CORP4 citations73
US5329146AJul 12, 1994
DRAM having trench type capacitor extending through field oxide
MITSUBISHI ELECTRIC CORP4 citations62
US6607964B2Aug 19, 2003
Method of manufacturing semiconductor device
MITSUBISHI ELECTRIC CORP0 citations41
RENESAS TECH CORP
3 patentsUS6680539B2Jan 20, 2004
Semiconductor device, semiconductor device pattern designing method, and semiconductor device pattern designing apparatus
RENESAS TECH CORP13 citations82
US6822279B2Nov 23, 2004
Semiconductor device and method of fabricating the same
RENESAS TECH CORP11 citations73
US6670680B2Dec 30, 2003
Semiconductor device comprising a dual gate CMOS
RENESAS TECH CORP8 citations70