Inventor
ISHIHARA TOSHINOBU
JP127 patents
⚠️ This page may combine multiple inventors who share the name “ISHIHARA TOSHINOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
42 patentsUS5942367AAug 24, 1999
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO91 citations99
US5972560AOct 26, 1999
High molecular weight silicone compound, chemically amplified positive resist composition and patterning method
SHINETSU CHEMICAL CO94 citations98
US6096234AAug 1, 2000
Cross-linked polymer solid electrolyte, method of manufacturing cross-linked solid polymer electrolyte, composite solid electrolyte, and thin solid cell employing composite solid electrolyte
SHINETSU CHEMICAL CO94 citations97
US6309796B1Oct 30, 2001
High molecular weight silicone compounds resist compositions, and patterning method
SHINETSU CHEMICAL CO63 citations96
US6048661AApr 11, 2000
Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation
SHINETSU CHEMICAL CO80 citations96
US5882844AMar 16, 1999
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO60 citations96
US5876900AMar 2, 1999
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO68 citations96
US5691396ANov 25, 1997
Polysiloxane compounds and positive resist compositions
SHINETSU CHEMICAL CO72 citations96
US5612170AMar 18, 1997
Positive resist composition
SHINETSU CHEMICAL CO72 citations96
US5352564AOct 4, 1994
Resist compositions
SHINETSU CHEMICAL CO57 citations96
US7179545B2Feb 20, 2007
Halftone phase shift mask blank, and method of manufacture
SHINETSU CHEMICAL CO20 citations93
US6919161B2Jul 19, 2005
Silicon-containing polymer, resist composition and patterning process
SHINETSU CHEMICAL CO32 citations93
US6902772B2Jun 7, 2005
Silicon-containing polymer, resist composition and patterning process
SHINETSU CHEMICAL CO23 citations93
US6730453B2May 4, 2004
High molecular weight silicone compounds, resist compositions, and patterning method
SHINETSU CHEMICAL CO42 citations93
US6623909B2Sep 23, 2003
Polymers, resist compositions and patterning process
SHINETSU CHEMICAL CO38 citations93
US6455223B1Sep 24, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO28 citations93
US6414101B1Jul 2, 2002
Dendritic polymers and making method
SHINETSU CHEMICAL CO20 citations93
US6312869B1Nov 6, 2001
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO20 citations93
US6114462ASep 5, 2000
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO28 citations93
US6106993AAug 22, 2000
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO44 citations93
US6027854AFeb 22, 2000
Polymers chemically amplified positive resist compositions, and patterning method
SHINETSU CHEMICAL CO21 citations93
US4593112AJun 3, 1986
Method for the preparation of a tert-hydrocarbyl silyl compound
SHINETSU CHEMICAL CO26 citations93
US6156477ADec 5, 2000
Polymers and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO33 citations92
US6066433AMay 23, 2000
High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method
SHINETSU CHEMICAL CO19 citations92
US6033828AMar 7, 2000
Partially hydrogenated polymers and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO23 citations92
US6022665AFeb 8, 2000
Polymers and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO20 citations92
US5849461ADec 15, 1998
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO29 citations92
US5847218ADec 8, 1998
Sulfonium salts and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO39 citations92
US5844057ADec 1, 1998
Polymers and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO31 citations92
US5772925AJun 30, 1998
Anti-reflective coating composition
SHINETSU CHEMICAL CO27 citations92
US5773200AJun 30, 1998
Positive resist composition suitable for lift-off technique and pattern forming method
SHINETSU CHEMICAL CO22 citations92
US5759739AJun 2, 1998
Resist composition with polymeric dissolution inhibitor and alkali soluble resin
SHINETSU CHEMICAL CO39 citations92
US5750309AMay 12, 1998
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO39 citations92
US5731126AMar 24, 1998
Chemically amplified positive resist compositions
SHINETSU CHEMICAL CO48 citations92
US5624787AApr 29, 1997
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO31 citations92
US5569784AOct 29, 1996
Sulfonium salt and resist composition
SHINETSU CHEMICAL CO29 citations92
US5529888AJun 25, 1996
Water-soluble film forming composition
SHINETSU CHEMICAL CO22 citations92
US5393815AFeb 28, 1995
Silazane-based, heat resistant, dielectric coating compositions
SHINETSU CHEMICAL CO23 citations92
US5326895AJul 5, 1994
3-(vinylbenzyloxy)propylsilane compounds
SHINETSU CHEMICAL CO34 citations92
US4657991AApr 14, 1987
Precursor composition of silicon carbide
SHINETSU CHEMICAL CO25 citations92
US5705702AJan 6, 1998
Method for preparing triarylsulfonium salts
SHINETSU CHEMICAL CO43 citations91
US5989305ANov 23, 1999
Feeder of a solid organometallic compound
SHINETSU CHEMICAL CO30 citations89
HAKKO CORP
4 patentsMATSUSHITA ELECTRIC INDUSTRIAL CO LTD
2 patentsSHI ETSU CHEMICAL CO LTD
1 patentSTEC INC
1 patentShowing the top 50 of 127 patents by PatentIndex Score.