P

Inventor

ISHIHARA TOSHINOBU

JP127 patents
⚠️ This page may combine multiple inventors who share the name “ISHIHARA TOSHINOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

42 patents
US5942367AAug 24, 1999

Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group

SHINETSU CHEMICAL CO91 citations99
US5972560AOct 26, 1999

High molecular weight silicone compound, chemically amplified positive resist composition and patterning method

SHINETSU CHEMICAL CO94 citations98
US6096234AAug 1, 2000

Cross-linked polymer solid electrolyte, method of manufacturing cross-linked solid polymer electrolyte, composite solid electrolyte, and thin solid cell employing composite solid electrolyte

SHINETSU CHEMICAL CO94 citations97
US6309796B1Oct 30, 2001

High molecular weight silicone compounds resist compositions, and patterning method

SHINETSU CHEMICAL CO63 citations96
US6048661AApr 11, 2000

Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation

SHINETSU CHEMICAL CO80 citations96
US5882844AMar 16, 1999

Chemically amplified positive resist composition

SHINETSU CHEMICAL CO60 citations96
US5876900AMar 2, 1999

Chemically amplified positive resist composition

SHINETSU CHEMICAL CO68 citations96
US5691396ANov 25, 1997

Polysiloxane compounds and positive resist compositions

SHINETSU CHEMICAL CO72 citations96
US5612170AMar 18, 1997

Positive resist composition

SHINETSU CHEMICAL CO72 citations96
US5352564AOct 4, 1994

Resist compositions

SHINETSU CHEMICAL CO57 citations96
US7179545B2Feb 20, 2007

Halftone phase shift mask blank, and method of manufacture

SHINETSU CHEMICAL CO20 citations93
US6919161B2Jul 19, 2005

Silicon-containing polymer, resist composition and patterning process

SHINETSU CHEMICAL CO32 citations93
US6902772B2Jun 7, 2005

Silicon-containing polymer, resist composition and patterning process

SHINETSU CHEMICAL CO23 citations93
US6730453B2May 4, 2004

High molecular weight silicone compounds, resist compositions, and patterning method

SHINETSU CHEMICAL CO42 citations93
US6623909B2Sep 23, 2003

Polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO38 citations93
US6455223B1Sep 24, 2002

Resist compositions and patterning process

SHINETSU CHEMICAL CO28 citations93
US6414101B1Jul 2, 2002

Dendritic polymers and making method

SHINETSU CHEMICAL CO20 citations93
US6312869B1Nov 6, 2001

Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group

SHINETSU CHEMICAL CO20 citations93
US6114462ASep 5, 2000

Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group

SHINETSU CHEMICAL CO28 citations93
US6106993AAug 22, 2000

Chemically amplified positive resist composition

SHINETSU CHEMICAL CO44 citations93
US6027854AFeb 22, 2000

Polymers chemically amplified positive resist compositions, and patterning method

SHINETSU CHEMICAL CO21 citations93
US4593112AJun 3, 1986

Method for the preparation of a tert-hydrocarbyl silyl compound

SHINETSU CHEMICAL CO26 citations93
US6156477ADec 5, 2000

Polymers and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO33 citations92
US6066433AMay 23, 2000

High molecular weight silicone compounds, chemically amplified positive resist compositions, and patterning method

SHINETSU CHEMICAL CO19 citations92
US6033828AMar 7, 2000

Partially hydrogenated polymers and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO23 citations92
US6022665AFeb 8, 2000

Polymers and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO20 citations92
US5849461ADec 15, 1998

Chemically amplified positive resist composition

SHINETSU CHEMICAL CO29 citations92
US5847218ADec 8, 1998

Sulfonium salts and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO39 citations92
US5844057ADec 1, 1998

Polymers and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO31 citations92
US5772925AJun 30, 1998

Anti-reflective coating composition

SHINETSU CHEMICAL CO27 citations92
US5773200AJun 30, 1998

Positive resist composition suitable for lift-off technique and pattern forming method

SHINETSU CHEMICAL CO22 citations92
US5759739AJun 2, 1998

Resist composition with polymeric dissolution inhibitor and alkali soluble resin

SHINETSU CHEMICAL CO39 citations92
US5750309AMay 12, 1998

Chemically amplified positive resist composition

SHINETSU CHEMICAL CO39 citations92
US5731126AMar 24, 1998

Chemically amplified positive resist compositions

SHINETSU CHEMICAL CO48 citations92
US5624787AApr 29, 1997

Chemically amplified positive resist composition

SHINETSU CHEMICAL CO31 citations92
US5569784AOct 29, 1996

Sulfonium salt and resist composition

SHINETSU CHEMICAL CO29 citations92
US5529888AJun 25, 1996

Water-soluble film forming composition

SHINETSU CHEMICAL CO22 citations92
US5393815AFeb 28, 1995

Silazane-based, heat resistant, dielectric coating compositions

SHINETSU CHEMICAL CO23 citations92
US5326895AJul 5, 1994

3-(vinylbenzyloxy)propylsilane compounds

SHINETSU CHEMICAL CO34 citations92
US4657991AApr 14, 1987

Precursor composition of silicon carbide

SHINETSU CHEMICAL CO25 citations92
US5705702AJan 6, 1998

Method for preparing triarylsulfonium salts

SHINETSU CHEMICAL CO43 citations91
US5989305ANov 23, 1999

Feeder of a solid organometallic compound

SHINETSU CHEMICAL CO30 citations89

HAKKO CORP

4 patents

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

2 patents

SHI ETSU CHEMICAL CO LTD

1 patent

STEC INC

1 patent

Showing the top 50 of 127 patents by PatentIndex Score.