Inventor

THAKAR GAUTAM V

US2 patents

Patents

2 patents

US6624068B2Sep 23, 2003

Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography

TEXAS INSTRUMENTS INC64 citations93

US6803661B2Oct 12, 2004

Polysilicon processing using an anti-reflective dual layer hardmask for 193 nm lithography

TEXAS INSTRUMENTS INC23 citations89