P

Inventor

AMINPUR MASSUD

FR17 patents
⚠️ This page may combine multiple inventors who share the name “AMINPUR MASSUD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ADVANCED MICRO DEVICES INC

15 patents
US6482726B1Nov 19, 2002

Control trimming of hard mask for sub-100 nanometer transistor gate

ADVANCED MICRO DEVICES INC85 citations98
US6893956B2May 17, 2005

Barrier layer for a copper metallization layer including a low-k dielectric

ADVANCED MICRO DEVICES INC20 citations92
US7314793B2Jan 1, 2008

Technique for controlling mechanical stress in a channel region by spacer removal

ADVANCED MICRO DEVICES INC39 citations90
US7517816B2Apr 14, 2009

Technique for creating different mechanical stress in different channel regions by forming an etch stop layer having differently modified intrinsic stress

ADVANCED MICRO DEVICES INC17 citations84
US7151055B2Dec 19, 2006

Technique for forming a gate electrode by using a hard mask

ADVANCED MICRO DEVICES INC13 citations83
US6828240B2Dec 7, 2004

Method of manufacturing multi-level contacts by sizing of contact sizes in integrated circuits

ADVANCED MICRO DEVICES INC13 citations83
US6699641B1Mar 2, 2004

Photosensitive bottom anti-reflective coating

ADVANCED MICRO DEVICES INC16 citations83
US7309654B2Dec 18, 2007

Technique for reducing etch damage during the formation of vias and trenches in interlayer dielectrics

ADVANCED MICRO DEVICES INC14 citations82
US7256113B1Aug 14, 2007

System for forming a semiconductor device and method thereof

ADVANCED MICRO DEVICES INC19 citations82
US6727558B1Apr 27, 2004

Channel isolation using dielectric isolation structures

ADVANCED MICRO DEVICES INC9 citations73
US6624035B1Sep 23, 2003

Method of forming a hard mask for halo implants

ADVANCED MICRO DEVICES INC9 citations73
US6569606B1May 27, 2003

Method of reducing photoresist shadowing during angled implants

ADVANCED MICRO DEVICES INC10 citations70
US7005380B2Feb 28, 2006

Simultaneous formation of device and backside contacts on wafers having a buried insulator layer

ADVANCED MICRO DEVICES INC3 citations62
US6617219B1Sep 9, 2003

Semiconductor device and method for lowering miller capacitance by modifying source/drain extensions for high speed microprocessors

ADVANCED MICRO DEVICES INC4 citations62
US7087509B1Aug 8, 2006

Method of forming a gate electrode on a semiconductor device and a device incorporating same

ADVANCED MICRO DEVICES INC0 citations50

FROHBERG KAI

1 patent

GLOBALFOUNDRIES INC

1 patent