Inventor
AMINPUR MASSUD
FR17 patents
⚠️ This page may combine multiple inventors who share the name “AMINPUR MASSUD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
15 patentsUS6482726B1Nov 19, 2002
Control trimming of hard mask for sub-100 nanometer transistor gate
ADVANCED MICRO DEVICES INC85 citations98
US6893956B2May 17, 2005
Barrier layer for a copper metallization layer including a low-k dielectric
ADVANCED MICRO DEVICES INC20 citations92
US7314793B2Jan 1, 2008
Technique for controlling mechanical stress in a channel region by spacer removal
ADVANCED MICRO DEVICES INC39 citations90
US7517816B2Apr 14, 2009
Technique for creating different mechanical stress in different channel regions by forming an etch stop layer having differently modified intrinsic stress
ADVANCED MICRO DEVICES INC17 citations84
US7151055B2Dec 19, 2006
Technique for forming a gate electrode by using a hard mask
ADVANCED MICRO DEVICES INC13 citations83
US6828240B2Dec 7, 2004
Method of manufacturing multi-level contacts by sizing of contact sizes in integrated circuits
ADVANCED MICRO DEVICES INC13 citations83
US6699641B1Mar 2, 2004
Photosensitive bottom anti-reflective coating
ADVANCED MICRO DEVICES INC16 citations83
US7309654B2Dec 18, 2007
Technique for reducing etch damage during the formation of vias and trenches in interlayer dielectrics
ADVANCED MICRO DEVICES INC14 citations82
US7256113B1Aug 14, 2007
System for forming a semiconductor device and method thereof
ADVANCED MICRO DEVICES INC19 citations82
US6727558B1Apr 27, 2004
Channel isolation using dielectric isolation structures
ADVANCED MICRO DEVICES INC9 citations73
US6624035B1Sep 23, 2003
Method of forming a hard mask for halo implants
ADVANCED MICRO DEVICES INC9 citations73
US6569606B1May 27, 2003
Method of reducing photoresist shadowing during angled implants
ADVANCED MICRO DEVICES INC10 citations70
US7005380B2Feb 28, 2006
Simultaneous formation of device and backside contacts on wafers having a buried insulator layer
ADVANCED MICRO DEVICES INC3 citations62
US6617219B1Sep 9, 2003
Semiconductor device and method for lowering miller capacitance by modifying source/drain extensions for high speed microprocessors
ADVANCED MICRO DEVICES INC4 citations62
US7087509B1Aug 8, 2006
Method of forming a gate electrode on a semiconductor device and a device incorporating same
ADVANCED MICRO DEVICES INC0 citations50