Inventor

CHO HAG-JU

KR25 patents

⚠️ This page may combine multiple inventors who share the name “CHO HAG-JU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHO HAG-JU

SAMSUNG ELECTRONICS CO LTD

Semiconductor memory device having capacitor protection layer and method for manufacturing the same

Methods of manufacturing integrated circuit devices that include a metal oxide layer disposed on another layer to protect the other layer from diffusion of impurities and integrated circuit devices manufactured using same

Method of fabricating integrated circuit devices having dielectric regions protected with multi-layer insulation structures

Methods of forming integrated circuit capacitors having plasma treated regions therein

Methods of forming integrated circuit capacitors using metal reflow techniques

Method of fabricating semiconductor device having dual gate

Methods of forming a composite dielectric structure and methods of manufacturing a semiconductor device including a composite dielectric structure

Method of manufacturing a semiconductor device having a dual gate structure

Integrated circuit device including field isolation layer and method of manufacturing the same

Integrated circuit devices having dielectric regions protected with multi-layer insulation structures

Method of fabricating a gate

Method of fabricating semiconductor device having dual gate

Semiconductor devices having transistors with different gate structures and methods of fabricating the same

Semiconductor device having metal gate patterns and related method of manufacture

Methods of fabricating semiconductor devices having transistors with different gate structures

Methods of forming different gate structures in NMOS and PMOS regions and gate structures so formed

Method of manufacturing dual gate semiconductor device

Method of manufacturing semiconductor device with dual gates

NA HOON-JOO

Methods of forming semiconductor devices having gates with different work functions using selective injection of diffusion inhibiting materials

Method of fabricating semiconductor device having dual gate

LEE HYO-SAN

Method of manufacturing a semiconductor device using an etchant

IMEC

Semiconductor device and method for fabricating the same

CHO HAG-JU

Semiconductor device and method for fabricating the same

KIM JONG-PIL

Method of fabricating gate and method of manufacturing semiconductor device using the same

GOVOREANU BOGDAN

Non-volatile memory device with improved immunity to erase saturation and method for manufacturing same