Inventor

COTTON RANDY W

US2 patents

Patents

2 patents

US7544575B2Jun 9, 2009

Dual metal silicide scheme using a dual spacer process

FREESCALE SEMICONDUCTOR INC12 citations81

US7071038B2Jul 4, 2006

Method of forming a semiconductor device having a dielectric layer with high dielectric constant

FREESCALE SEMICONDUCTOR INC10 citations71