Inventor
SMITH BRUCE W
US28 patents
⚠️ This page may combine multiple inventors who share the name “SMITH BRUCE W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
8 patentsUS6466304B1Oct 15, 2002
Illumination device for projection system and method for fabricating
ASML NETHERLANDS BV61 citations96
US6525806B1Feb 25, 2003
Apparatus and method of image enhancement through spatial filtering
ASML NETHERLANDS BV37 citations92
US6846595B2Jan 25, 2005
Method of improving photomask geometry
ASML NETHERLANDS BV14 citations84
US6788388B2Sep 7, 2004
Illumination device for projection system and method for fabricating
ASML NETHERLANDS BV8 citations74
US6480263B1Nov 12, 2002
Apparatus and method for phase shift photomasking
ASML NETHERLANDS BV12 citations74
USRE40239EApr 15, 2008
Illumination device for projection system and method for fabricating
ASML NETHERLANDS BV3 citations63
US6791667B2Sep 14, 2004
Illumination device for projection system and method for fabricating
ASML NETHERLANDS BV1 citations63
US7092073B2Aug 15, 2006
Method of illuminating a photomask using chevron illumination
ASML NETHERLANDS BV1 citations52
ROCHESTER INST TECH
8 patentsUS5939227AAug 17, 1999
Multi-layered attenuated phase shift mask and a method for making the mask
ROCHESTER INST TECH65 citations96
US6395433B1May 28, 2002
Photomask for projection lithography at or below about 160 nm and a method thereof
ROCHESTER INST TECH38 citations92
US6309780B1Oct 30, 2001
Attenuated phase shift mask and a method for making the mask
ROCHESTER INST TECH21 citations92
US6556361B1Apr 29, 2003
Projection imaging system with a non-circular aperture and a method thereof
ROCHESTER INST TECH13 citations84
US6368755B1Apr 9, 2002
Masks for use in optical lithography below 180 nm
ROCHESTER INST TECH7 citations74
US6541750B1Apr 1, 2003
Modification of a projection imaging system with a non-circular aperture and a method thereof
ROCHESTER INST TECH3 citations63
USRE39349EOct 17, 2006
Masks for use in optical lithography below 180 nm
ROCHESTER INST TECH0 citations52
US6835505B2Dec 28, 2004
Mask for projection photolithography at or below about 160 nm and a method thereof
ROCHESTER INST TECH1 citations52
SMITH BRUCE W
6 patentsUS7233887B2Jun 19, 2007
Method of photomask correction and its optimization using localized frequency analysis
SMITH BRUCE W26 citations92
US7136143B2Nov 14, 2006
Method for aberration detection and measurement
SMITH BRUCE W42 citations92
US7768648B2Aug 3, 2010
Method for aberration evaluation in a projection system
SMITH BRUCE W2 citations62
US7345735B2Mar 18, 2008
Apparatus for aberration detection and measurement
SMITH BRUCE W4 citations62
US7170588B2Jan 30, 2007
Reduction Smith-Talbot interferometer prism for micropatterning
SMITH BRUCE W5 citations62
US8852850B2Oct 7, 2014
Method of photolithography using a fluid and a system thereof
SMITH BRUCE W0 citations51