P

Inventor

NAGASHIMA SHINJI

JP26 patents

Patents

26 patents
US5826129AOct 20, 1998

Substrate processing system

TOKYO ELECTRON LTD552 citations99
US6190459B1Feb 20, 2001

Gas treatment apparatus

TOKYO ELECTRON LTD104 citations98
US6248168B1Jun 19, 2001

Spin coating apparatus including aging unit and solvent replacement unit

TOKYO ELECTRON LTD63 citations95
US6982002B2Jan 3, 2006

Apparatus and method for forming coating film

TOKYO ELECTRON LTD19 citations92
US6808567B2Oct 26, 2004

Gas treatment apparatus

TOKYO ELECTRON LTD14 citations92
US6660096B2Dec 9, 2003

Gas treatment apparatus

TOKYO ELECTRON LTD17 citations92
US6589339B2Jul 8, 2003

Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film

TOKYO ELECTRON LTD26 citations92
US6590186B2Jul 8, 2003

Heat treatment apparatus and method

TOKYO ELECTRON LTD24 citations92
US6564474B2May 20, 2003

Apparatus for heat processing of substrate

TOKYO ELECTRON LTD18 citations92
US6501191B2Dec 31, 2002

Heat treatment apparatus and method

TOKYO ELECTRON LTD28 citations92
US6419751B1Jul 16, 2002

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD19 citations92
US6350316B1Feb 26, 2002

Apparatus for forming coating film

TOKYO ELECTRON LTD25 citations92
US6261365B1Jul 17, 2001

Heat treatment method, heat treatment apparatus and treatment system

TOKYO ELECTRON LTD19 citations92
US6786974B2Sep 7, 2004

Insulating film forming method and insulating film forming apparatus

TOKYO ELECTRON LTD28 citations90
US6413317B1Jul 2, 2002

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD23 citations89
US6827973B2Dec 7, 2004

Substrate processing method

TOKYO ELECTRON LTD18 citations84
US6673155B2Jan 6, 2004

Apparatus for forming coating film and apparatus for curing the coating film

TOKYO ELECTRON LTD16 citations83
US6665952B2Dec 23, 2003

Method for heat processing of substrate

TOKYO ELECTRON LTD12 citations74
US6605550B2Aug 12, 2003

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD5 citations74
US6726775B2Apr 27, 2004

Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film

TOKYO ELECTRON LTD6 citations73
US6197385B1Mar 6, 2001

Film forming apparatus, substrate conveying apparatus, film forming method, and substrate conveying method

TOKYO ELECTRON LTD10 citations73
US7520936B2Apr 21, 2009

Hardening processing apparatus, hardening processing method, and coating film forming apparatus

TOKYO ELECTRON LTD6 citations62
US6979474B2Dec 27, 2005

Heat treatment method, heat treatment apparatus and treatment system

TOKYO ELECTRON LTD4 citations62
US6730620B2May 4, 2004

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD2 citations59
US7205024B2Apr 17, 2007

Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film

TOKYO ELECTRON LTD0 citations51
US6573191B1Jun 3, 2003

Insulating film forming method and insulating film forming apparatus

TOKYO ELECTRON LTD1 citations50