Inventor
NAGASHIMA SHINJI
JP26 patents
Patents
26 patentsUS5826129AOct 20, 1998
Substrate processing system
TOKYO ELECTRON LTD552 citations99
US6190459B1Feb 20, 2001
Gas treatment apparatus
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US6248168B1Jun 19, 2001
Spin coating apparatus including aging unit and solvent replacement unit
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US6982002B2Jan 3, 2006
Apparatus and method for forming coating film
TOKYO ELECTRON LTD19 citations92
US6808567B2Oct 26, 2004
Gas treatment apparatus
TOKYO ELECTRON LTD14 citations92
US6660096B2Dec 9, 2003
Gas treatment apparatus
TOKYO ELECTRON LTD17 citations92
US6589339B2Jul 8, 2003
Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film
TOKYO ELECTRON LTD26 citations92
US6590186B2Jul 8, 2003
Heat treatment apparatus and method
TOKYO ELECTRON LTD24 citations92
US6564474B2May 20, 2003
Apparatus for heat processing of substrate
TOKYO ELECTRON LTD18 citations92
US6501191B2Dec 31, 2002
Heat treatment apparatus and method
TOKYO ELECTRON LTD28 citations92
US6419751B1Jul 16, 2002
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD19 citations92
US6350316B1Feb 26, 2002
Apparatus for forming coating film
TOKYO ELECTRON LTD25 citations92
US6261365B1Jul 17, 2001
Heat treatment method, heat treatment apparatus and treatment system
TOKYO ELECTRON LTD19 citations92
US6786974B2Sep 7, 2004
Insulating film forming method and insulating film forming apparatus
TOKYO ELECTRON LTD28 citations90
US6413317B1Jul 2, 2002
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD23 citations89
US6827973B2Dec 7, 2004
Substrate processing method
TOKYO ELECTRON LTD18 citations84
US6673155B2Jan 6, 2004
Apparatus for forming coating film and apparatus for curing the coating film
TOKYO ELECTRON LTD16 citations83
US6665952B2Dec 23, 2003
Method for heat processing of substrate
TOKYO ELECTRON LTD12 citations74
US6605550B2Aug 12, 2003
Substrate processing method and substrate processing apparatus
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US6726775B2Apr 27, 2004
Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film
TOKYO ELECTRON LTD6 citations73
US6197385B1Mar 6, 2001
Film forming apparatus, substrate conveying apparatus, film forming method, and substrate conveying method
TOKYO ELECTRON LTD10 citations73
US7520936B2Apr 21, 2009
Hardening processing apparatus, hardening processing method, and coating film forming apparatus
TOKYO ELECTRON LTD6 citations62
US6979474B2Dec 27, 2005
Heat treatment method, heat treatment apparatus and treatment system
TOKYO ELECTRON LTD4 citations62
US6730620B2May 4, 2004
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD2 citations59
US7205024B2Apr 17, 2007
Method of coating film, coating unit, aging unit, solvent replacement unit, and apparatus for coating film
TOKYO ELECTRON LTD0 citations51
US6573191B1Jun 3, 2003
Insulating film forming method and insulating film forming apparatus
TOKYO ELECTRON LTD1 citations50