Inventor
HUANG TE-CHIH
TW24 patents
⚠️ This page may combine multiple inventors who share the name “HUANG TE-CHIH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
7 patentsUS10915017B2Feb 9, 2021
Multi-function overlay marks for reducing noise and extracting focus and critical dimension information
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US12055860B2Aug 6, 2024
Multi-function overlay marks for reducing noise and extracting focus and critical dimension information
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11835864B2Dec 5, 2023
Multi-function overlay marks for reducing noise and extracting focus and critical dimension information
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11448975B2Sep 20, 2022
Multi-function overlay marks for reducing noise and extracting focus and critical dimension information
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11624985B2Apr 11, 2023
Methods of defect inspection
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations58
US10795270B2Oct 6, 2020
Methods of defect inspection
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations58
US12196687B2Jan 14, 2025
Method for inspecting pattern defects
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations57
ASML NETHERLANDS BV
5 patentsUS9903823B2Feb 27, 2018
Metrology method and apparatus
ASML NETHERLANDS BV10 citations83
US10180628B2Jan 15, 2019
Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method
ASML NETHERLANDS BV4 citations73
US10073357B2Sep 11, 2018
Measuring a process parameter for a manufacturing process involving lithography
ASML NETHERLANDS BV2 citations73
US10162272B2Dec 25, 2018
Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations72
US11320745B2May 3, 2022
Measuring a process parameter for a manufacturing process involving lithography
ASML NETHERLANDS BV0 citations62
TAIWAN SEMICONDUCTOR MFG
5 patentsUSRE45943EMar 22, 2016
Measurement of overlay offset in semiconductor processing
TAIWAN SEMICONDUCTOR MFG3 citations73
US8003303B2Aug 23, 2011
Intensity selective exposure method and apparatus
TAIWAN SEMICONDUCTOR MFG4 citations63
US7858404B2Dec 28, 2010
Measurement of overlay offset in semiconductor processing
TAIWAN SEMICONDUCTOR MFG3 citations63
US9026957B2May 5, 2015
Method of defining an intensity selective exposure photomask
TAIWAN SEMICONDUCTOR MFG1 citations62
US7796249B2Sep 14, 2010
Mask haze early detection
TAIWAN SEMICONDUCTOR MFG5 citations62