Inventor
AITA KAZUO
JP22 patents
⚠️ This page may combine multiple inventors who share the name “AITA KAZUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO INSTR INC
8 patentsUS6392230B1May 21, 2002
Focused ion beam forming method
SEIKO INSTR INC20 citations92
US6365905B1Apr 2, 2002
Focused ion beam processing apparatus
SEIKO INSTR INC24 citations92
US5405734AApr 11, 1995
Method for correcting a patterned film using an ion beam
SEIKO INSTR INC51 citations92
US6544692B1Apr 8, 2003
Black defect correction method and black defect correction device for photomask
SEIKO INSTR INC10 citations73
US6281496B1Aug 28, 2001
Observing/forming method with focused ion beam and apparatus therefor
SEIKO INSTR INC10 citations73
US5854488ADec 29, 1998
Ion beam machining method and device thereof
SEIKO INSTR INC11 citations73
US6642512B2Nov 4, 2003
Focused ion beam apparatus
SEIKO INSTR INC2 citations62
US6467426B1Oct 22, 2002
Photomask correction device
SEIKO INSTR INC6 citations62
HITACHI HIGH TECH SCIENCE CORP
5 patentsUS8764994B2Jul 1, 2014
Method for fabricating emitter
HITACHI HIGH TECH SCIENCE CORP4 citations72
US9378858B2Jun 28, 2016
Repair apparatus
HITACHI HIGH TECH SCIENCE CORP2 citations62
US8999178B2Apr 7, 2015
Method for fabricating emitter
HITACHI HIGH TECH SCIENCE CORP0 citations51
US10276343B2Apr 30, 2019
Method for acquiring image and ion beam apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations50
US10014157B2Jul 3, 2018
Method for acquiring image and ion beam apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations50
HITACHI HIGH-TECH SCIENCE CORP
3 patentsUS9773634B2Sep 26, 2017
Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus
HITACHI HIGH-TECH SCIENCE CORP2 citations72
US9793085B2Oct 17, 2017
Focused ion beam apparatus
HITACHI HIGH-TECH SCIENCE CORP0 citations51
US9583299B2Feb 28, 2017
Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus
HITACHI HIGH-TECH SCIENCE CORP0 citations51
MITSUBISHI ELECTRIC CORP
2 patentsSII NANOTECHNOLOGY INC
2 patentsKAITO TAKASHI
2 patentsUS8274063B2Sep 25, 2012
Composite focused ion beam device, process observation method using the same, and processing method
KAITO TAKASHI4 citations60
US8269194B2Sep 18, 2012
Composite focused ion beam device, and processing observation method and processing method using the same
KAITO TAKASHI3 citations60