Inventor
KOZAKAI TOMOKAZU
JP21 patents
⚠️ This page may combine multiple inventors who share the name “KOZAKAI TOMOKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH SCIENCE CORP
9 patentsUS8764994B2Jul 1, 2014
Method for fabricating emitter
HITACHI HIGH TECH SCIENCE CORP4 citations72
US9378858B2Jun 28, 2016
Repair apparatus
HITACHI HIGH TECH SCIENCE CORP2 citations62
US8890093B2Nov 18, 2014
Charged particle beam apparatus and method for forming observation image
HITACHI HIGH TECH SCIENCE CORP2 citations62
US11081312B2Aug 3, 2021
Method of manufacturing emitter, emitter, and focused ion beam apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations59
US9336979B2May 10, 2016
Focused ion beam apparatus with precious metal emitter surface
HITACHI HIGH TECH SCIENCE CORP1 citations51
US8999178B2Apr 7, 2015
Method for fabricating emitter
HITACHI HIGH TECH SCIENCE CORP0 citations51
US10276343B2Apr 30, 2019
Method for acquiring image and ion beam apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations50
US10014157B2Jul 3, 2018
Method for acquiring image and ion beam apparatus
HITACHI HIGH TECH SCIENCE CORP0 citations50
US9245712B2Jan 26, 2016
Focused ion beam system
HITACHI HIGH TECH SCIENCE CORP0 citations41
SII NANOTECHNOLOGY INC
7 patentsUS7750318B2Jul 6, 2010
Working method by focused ion beam and focused ion beam working apparatus
SII NANOTECHNOLOGY INC4 citations61
US7488961B2Feb 10, 2009
Charged particle beam irradiation method and charged particle beam apparatus
SII NANOTECHNOLOGY INC2 citations60
US7485880B2Feb 3, 2009
Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method
SII NANOTECHNOLOGY INC2 citations60
US7927769B2Apr 19, 2011
Method for fabricating EUVL mask
SII NANOTECHNOLOGY INC1 citations51
US7576340B2Aug 18, 2009
Focused ion beam processing method
SII NANOTECHNOLOGY INC0 citations51
US7323685B2Jan 29, 2008
Ion beam processing method
SII NANOTECHNOLOGY INC0 citations51
US6780551B2Aug 24, 2004
Charged particle processing for forming pattern boundaries at a uniform thickness
SII NANOTECHNOLOGY INC0 citations51
HITACHI HIGH-TECH SCIENCE CORP
4 patentsUS9773634B2Sep 26, 2017
Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus
HITACHI HIGH-TECH SCIENCE CORP2 citations72
US9793085B2Oct 17, 2017
Focused ion beam apparatus
HITACHI HIGH-TECH SCIENCE CORP0 citations51
US9583299B2Feb 28, 2017
Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus
HITACHI HIGH-TECH SCIENCE CORP0 citations51
US9793092B2Oct 17, 2017
Charged particle beam apparatus and processing method
HITACHI HIGH-TECH SCIENCE CORP0 citations38