Inventor
NISHIKAWA MICHINORI
JP25 patents
⚠️ This page may combine multiple inventors who share the name “NISHIKAWA MICHINORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JSR CORP
21 patentsUS6576393B1Jun 10, 2003
Composition for resist underlayer film and method for producing the same
JSR CORP75 citations96
US6465368B2Oct 15, 2002
Method of manufacturing insulating film-forming material, the insulating film-forming material, and insulating film
JSR CORP59 citations95
US5969055AOct 19, 1999
Liquid crystal alignment agent
JSR CORP62 citations94
US6800330B2Oct 5, 2004
Composition for film formation, method of film formation, and silica-based film
JSR CORP43 citations92
US6503633B2Jan 7, 2003
Composition for film formation, process for producing composition for film formation, method of film formation, and silica-based film
JSR CORP22 citations92
US6472079B2Oct 29, 2002
Composition for film formation, method of film formation, and silica-based film
JSR CORP40 citations92
US6376634B1Apr 23, 2002
Composition for film formation and material for insulating film formation
JSR CORP51 citations89
US7128976B2Oct 31, 2006
Composition for film formation, method of film formation, and silica-based film
JSR CORP20 citations83
US6890605B2May 10, 2005
Method of film formation, insulating film, and substrate for semiconductor
JSR CORP19 citations83
US6797453B2Sep 28, 2004
Radiation sensitive composition for forming an insulating film, insulating film and display device
JSR CORP16 citations83
US6468589B2Oct 22, 2002
Composition for film formation and insulating film
JSR CORP10 citations74
US6824833B2Nov 30, 2004
Stacked film, insulating film and substrate for semiconductor
JSR CORP12 citations73
US7153767B2Dec 26, 2006
Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing
JSR CORP3 citations63
US6787193B2Sep 7, 2004
Method for the formation of silica film, silica film, insulating film, and semiconductor device
JSR CORP3 citations63
US6528605B1Mar 4, 2003
Diyne-containing (co)polymer, processes for producing the same, and cured film
JSR CORP6 citations62
US6852370B2Feb 8, 2005
Composition for film formation and material for insulating film formation
JSR CORP2 citations60
US6884862B2Apr 26, 2005
Polymer, process for production, composition for film formation containing the same, method of film formation, and insulating film
JSR CORP2 citations57
US6642352B2Nov 4, 2003
Method of manufacturing material for forming insulating film
JSR CORP6 citations57
US7320854B2Jan 22, 2008
Radiation sensitive refractive index changing composition, pattern forming method and optical material
JSR CORP0 citations51
US6749944B2Jun 15, 2004
Stacked film, method for the formation of stacked film, insulating film, and substrate for semiconductor
JSR CORP0 citations41
US9447323B2Sep 20, 2016
Method for producing liquid crystal display
JSR CORP0 citations39
JAPAN SYNTHETIC RUBBER CO LTD
4 patentsUS5276132AJan 4, 1994
Liquid crystal aligning agent and aligning agent-applied liquid crystal display device
JAPAN SYNTHETIC RUBBER CO LTD42 citations92
US5700860ADec 23, 1997
Liquid crystal orienting agent
JAPAN SYNTHETIC RUBBER CO LTD25 citations90
US5698135ADec 16, 1997
Liquid crystal-aligning agent
JAPAN SYNTHETIC RUBBER CO LTD8 citations73
US5478682ADec 26, 1995
Method for domain-dividing liquid crystal alignment film and liquid crystal device using domain-divided alignment film
JAPAN SYNTHETIC RUBBER CO LTD14 citations72