Inventor
HARTJES JOACHIM
DE30 patents
⚠️ This page may combine multiple inventors who share the name “HARTJES JOACHIM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
24 patentsUS9759550B2Sep 12, 2017
Projection exposure apparatus for microlithography comprising an optical distance measurement system
ZEISS CARL SMT GMBH2 citations73
US9465208B2Oct 11, 2016
Facet mirror device
ZEISS CARL SMT GMBH3 citations72
US9207541B2Dec 8, 2015
Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH6 citations72
US12436361B2Oct 7, 2025
Projection exposure apparatus for semiconductor lithography
ZEISS CARL SMT GMBH0 citations62
US12339587B2Jun 24, 2025
Facet assembly for a facet mirror
ZEISS CARL SMT GMBH0 citations62
US11467500B2Oct 11, 2022
Optical arrangement and method for repairing the optical arrangement after a shock load
ZEISS CARL SMT GMBH0 citations62
US11307503B2Apr 19, 2022
Support of an optical unit
ZEISS CARL SMT GMBH0 citations62
US11054755B2Jul 6, 2021
Optical module with an anticollision device for module components
ZEISS CARL SMT GMBH1 citations62
US9500957B2Nov 22, 2016
Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations62
US11320314B2May 3, 2022
Method and device for determining the heating state of an optical element in an optical system for microlithography
ZEISS CARL SMT GMBH0 citations60
US12271117B2Apr 8, 2025
Support for an optical element
ZEISS CARL SMT GMBH0 citations52
US10288894B2May 14, 2019
Optical component for use in a radiation source module of a projection exposure system
ZEISS CARL SMT GMBH0 citations52
US10012911B2Jul 3, 2018
Projection exposure apparatus with wavefront measuring device and optical wavefront manipulator
ZEISS CARL SMT GMBH1 citations52
US10613443B2Apr 7, 2020
Optical system, lithography apparatus and method
ZEISS CARL SMT GMBH0 citations51
US9846375B2Dec 19, 2017
Lithography apparatus with segmented mirror
ZEISS CARL SMT GMBH1 citations51
US9599910B2Mar 21, 2017
Facet mirror device
ZEISS CARL SMT GMBH0 citations51
US9671584B2Jun 6, 2017
Method and cooling system for cooling an optical element for EUV applications
ZEISS CARL SMT GMBH0 citations49
US10146138B2Dec 4, 2018
Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations47
US11137687B2Oct 5, 2021
Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma
ZEISS CARL SMT GMBH0 citations46
US10162267B2Dec 25, 2018
Projection exposure apparatus including mechanism to reduce influence of pressure fluctuations
ZEISS CARL SMT GMBH0 citations41
US10162270B2Dec 25, 2018
Projection exposure apparatus comprising a measuring system for measuring an optical element
ZEISS CARL SMT GMBH0 citations41
US8345219B2Jan 1, 2013
Method and apparatus for setting an illumination optical unit
ZEISS CARL SMT GMBH0 citations41
US9423590B2Aug 23, 2016
Liquid cooled EUV reflector
ZEISS CARL SMT GMBH0 citations40
US9684243B2Jun 20, 2017
Blocking element for protecting optical elements in projection exposure apparatuses
ZEISS CARL SMT GMBH0 citations30