Inventor
YU CHUN-WEI
TW27 patents
⚠️ This page may combine multiple inventors who share the name “YU CHUN-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
26 patentsUS9646889B1May 9, 2017
Method of removing a hard mask layer on a gate structure while forming a protective layer on the surface of a substrate
UNITED MICROELECTRONICS CORP5 citations83
US10332981B1Jun 25, 2019
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP5 citations82
US10796943B2Oct 6, 2020
Manufacturing method of semiconductor structure
UNITED MICROELECTRONICS CORP2 citations72
US10366991B1Jul 30, 2019
Semiconductor device and manufacturing method thereof
UNITED MICROELECTRONICS CORP2 citations72
US10079143B2Sep 18, 2018
Method of forming semiconductor device having wick structure
UNITED MICROELECTRONICS CORP3 citations72
US9960084B1May 1, 2018
Method for forming semiconductor device
UNITED MICROELECTRONICS CORP3 citations72
US9793105B1Oct 17, 2017
Fabricating method of fin field effect transistor (FinFET)
UNITED MICROELECTRONICS CORP2 citations72
US9728397B1Aug 8, 2017
Semiconductor device having the insulating layers cover a bottom portion of the fin shaped structure
UNITED MICROELECTRONICS CORP2 citations72
US11049971B2Jun 29, 2021
Semiconductor device having epitaxial structure
UNITED MICROELECTRONICS CORP2 citations71
US10446667B2Oct 15, 2019
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP2 citations71
US12317547B2May 27, 2025
Method of fabricating semiconductor device having epitaxial structure
UNITED MICROELECTRONICS CORP0 citations61
US11735661B2Aug 22, 2023
Method of fabricating semiconductor device having epitaxial structure
UNITED MICROELECTRONICS CORP0 citations61
US10651174B2May 12, 2020
FinFET structure and fabricating method of gate structure
UNITED MICROELECTRONICS CORP0 citations51
US10622481B2Apr 14, 2020
Method of rounding corners of a fin
UNITED MICROELECTRONICS CORP0 citations51
US10505041B2Dec 10, 2019
Semiconductor device having epitaxial layer with planar surface and protrusions
UNITED MICROELECTRONICS CORP0 citations51
US10460925B2Oct 29, 2019
Method for processing semiconductor device
UNITED MICROELECTRONICS CORP0 citations51
US10340268B2Jul 2, 2019
FinFET structure and fabricating method of gate structure
UNITED MICROELECTRONICS CORP0 citations51
US10332750B2Jun 25, 2019
Method for fabricating semiconductor device with strained silicon structure
UNITED MICROELECTRONICS CORP0 citations51
US9871113B2Jan 16, 2018
Semiconductor process
UNITED MICROELECTRONICS CORP0 citations51
US9514993B2Dec 6, 2016
Method for manufacturing semiconductor devices comprising epitaxial layers
UNITED MICROELECTRONICS CORP0 citations51
US12402367B2Aug 26, 2025
Semiconductor structure and manufacturing method thereof
UNITED MICROELECTRONICS CORP0 citations50
US10700202B2Jun 30, 2020
Semiconductor device and method for forming the same
UNITED MICROELECTRONICS CORP0 citations50
US10559655B1Feb 11, 2020
Semiconductor device and method for manufacturing the same
UNITED MICROELECTRONICS CORP0 citations41
US10332741B2Jun 25, 2019
Method for post chemical mechanical polishing clean
UNITED MICROELECTRONICS CORP0 citations41
US9966266B2May 8, 2018
Apparatus for semiconductor wafer treatment and semiconductor wafer treatment
UNITED MICROELECTRONICS CORP0 citations41
US9741572B1Aug 22, 2017
Method of forming oxide layer
UNITED MICROELECTRONICS CORP0 citations41