P

Inventor

YU CHUN-WEI

TW27 patents
⚠️ This page may combine multiple inventors who share the name “YU CHUN-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

UNITED MICROELECTRONICS CORP

26 patents
US9646889B1May 9, 2017

Method of removing a hard mask layer on a gate structure while forming a protective layer on the surface of a substrate

UNITED MICROELECTRONICS CORP5 citations83
US10332981B1Jun 25, 2019

Semiconductor device and method for fabricating the same

UNITED MICROELECTRONICS CORP5 citations82
US10796943B2Oct 6, 2020

Manufacturing method of semiconductor structure

UNITED MICROELECTRONICS CORP2 citations72
US10366991B1Jul 30, 2019

Semiconductor device and manufacturing method thereof

UNITED MICROELECTRONICS CORP2 citations72
US10079143B2Sep 18, 2018

Method of forming semiconductor device having wick structure

UNITED MICROELECTRONICS CORP3 citations72
US9960084B1May 1, 2018

Method for forming semiconductor device

UNITED MICROELECTRONICS CORP3 citations72
US9793105B1Oct 17, 2017

Fabricating method of fin field effect transistor (FinFET)

UNITED MICROELECTRONICS CORP2 citations72
US9728397B1Aug 8, 2017

Semiconductor device having the insulating layers cover a bottom portion of the fin shaped structure

UNITED MICROELECTRONICS CORP2 citations72
US11049971B2Jun 29, 2021

Semiconductor device having epitaxial structure

UNITED MICROELECTRONICS CORP2 citations71
US10446667B2Oct 15, 2019

Method for fabricating semiconductor device

UNITED MICROELECTRONICS CORP2 citations71
US12317547B2May 27, 2025

Method of fabricating semiconductor device having epitaxial structure

UNITED MICROELECTRONICS CORP0 citations61
US11735661B2Aug 22, 2023

Method of fabricating semiconductor device having epitaxial structure

UNITED MICROELECTRONICS CORP0 citations61
US10651174B2May 12, 2020

FinFET structure and fabricating method of gate structure

UNITED MICROELECTRONICS CORP0 citations51
US10622481B2Apr 14, 2020

Method of rounding corners of a fin

UNITED MICROELECTRONICS CORP0 citations51
US10505041B2Dec 10, 2019

Semiconductor device having epitaxial layer with planar surface and protrusions

UNITED MICROELECTRONICS CORP0 citations51
US10460925B2Oct 29, 2019

Method for processing semiconductor device

UNITED MICROELECTRONICS CORP0 citations51
US10340268B2Jul 2, 2019

FinFET structure and fabricating method of gate structure

UNITED MICROELECTRONICS CORP0 citations51
US10332750B2Jun 25, 2019

Method for fabricating semiconductor device with strained silicon structure

UNITED MICROELECTRONICS CORP0 citations51
US9871113B2Jan 16, 2018

Semiconductor process

UNITED MICROELECTRONICS CORP0 citations51
US9514993B2Dec 6, 2016

Method for manufacturing semiconductor devices comprising epitaxial layers

UNITED MICROELECTRONICS CORP0 citations51
US12402367B2Aug 26, 2025

Semiconductor structure and manufacturing method thereof

UNITED MICROELECTRONICS CORP0 citations50
US10700202B2Jun 30, 2020

Semiconductor device and method for forming the same

UNITED MICROELECTRONICS CORP0 citations50
US10559655B1Feb 11, 2020

Semiconductor device and method for manufacturing the same

UNITED MICROELECTRONICS CORP0 citations41
US10332741B2Jun 25, 2019

Method for post chemical mechanical polishing clean

UNITED MICROELECTRONICS CORP0 citations41
US9966266B2May 8, 2018

Apparatus for semiconductor wafer treatment and semiconductor wafer treatment

UNITED MICROELECTRONICS CORP0 citations41
US9741572B1Aug 22, 2017

Method of forming oxide layer

UNITED MICROELECTRONICS CORP0 citations41

FULLHOPE BIOMEDICAL CO LTD

1 patent