Inventor
LIU CHUEH-YANG
TW25 patents
Patents
25 patentsUS9716165B1Jul 25, 2017
Field-effect transistor and method of making the same
UNITED MICROELECTRONICS CORP15 citations92
US9646889B1May 9, 2017
Method of removing a hard mask layer on a gate structure while forming a protective layer on the surface of a substrate
UNITED MICROELECTRONICS CORP5 citations83
US10312084B2Jun 4, 2019
Semiconductor device and fabrication method thereof
UNITED MICROELECTRONICS CORP3 citations72
US10079143B2Sep 18, 2018
Method of forming semiconductor device having wick structure
UNITED MICROELECTRONICS CORP3 citations72
US9960084B1May 1, 2018
Method for forming semiconductor device
UNITED MICROELECTRONICS CORP3 citations72
US9793105B1Oct 17, 2017
Fabricating method of fin field effect transistor (FinFET)
UNITED MICROELECTRONICS CORP2 citations72
US9748111B2Aug 29, 2017
Method of fabricating semiconductor structure using planarization process and cleaning process
UNITED MICROELECTRONICS CORP2 citations72
US9728397B1Aug 8, 2017
Semiconductor device having the insulating layers cover a bottom portion of the fin shaped structure
UNITED MICROELECTRONICS CORP2 citations72
US9613808B1Apr 4, 2017
Method of forming multilayer hard mask with treatment for removing impurities and forming dangling bonds
UNITED MICROELECTRONICS CORP2 citations72
US9633904B1Apr 25, 2017
Method for manufacturing semiconductor device with epitaxial structure
UNITED MICROELECTRONICS CORP0 citations52
US9530886B1Dec 27, 2016
Semiconductor device with epitaxial structure and manufacturing method thereof
UNITED MICROELECTRONICS CORP1 citations52
US10651174B2May 12, 2020
FinFET structure and fabricating method of gate structure
UNITED MICROELECTRONICS CORP0 citations51
US10505041B2Dec 10, 2019
Semiconductor device having epitaxial layer with planar surface and protrusions
UNITED MICROELECTRONICS CORP0 citations51
US10340268B2Jul 2, 2019
FinFET structure and fabricating method of gate structure
UNITED MICROELECTRONICS CORP0 citations51
US10128366B2Nov 13, 2018
Field-effect transistor
UNITED MICROELECTRONICS CORP0 citations51
US9929264B2Mar 27, 2018
Field-effect transistor and method of making the same
UNITED MICROELECTRONICS CORP0 citations51
US9899520B2Feb 20, 2018
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP0 citations51
US9871113B2Jan 16, 2018
Semiconductor process
UNITED MICROELECTRONICS CORP0 citations51
US9627534B1Apr 18, 2017
Semiconductor MOS device having a dense oxide film on a spacer
UNITED MICROELECTRONICS CORP1 citations51
US9570315B2Feb 14, 2017
Method of interfacial oxide layer formation in semiconductor device
UNITED MICROELECTRONICS CORP0 citations51
US9466480B2Oct 11, 2016
Cleaning process for oxide
UNITED MICROELECTRONICS CORP1 citations51
US10199485B2Feb 5, 2019
Semiconductor device including quantum wires
UNITED MICROELECTRONICS CORP0 citations41
US9966266B2May 8, 2018
Apparatus for semiconductor wafer treatment and semiconductor wafer treatment
UNITED MICROELECTRONICS CORP0 citations41
US9741572B1Aug 22, 2017
Method of forming oxide layer
UNITED MICROELECTRONICS CORP0 citations41
US9741818B2Aug 22, 2017
Manufacturing method of semiconductor structure for improving quality of epitaxial layers
UNITED MICROELECTRONICS CORP0 citations40