Inventor
MIYASHITA TETSUYA
JP25 patents
⚠️ This page may combine multiple inventors who share the name “MIYASHITA TETSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
23 patentsUS11764092B2Sep 19, 2023
Substrate transfer apparatus and substrate processing system
TOKYO ELECTRON LTD6 citations86
US12211720B2Jan 28, 2025
Vacuum transfer device, substrate processing system, and substrate processing method
TOKYO ELECTRON LTD3 citations75
US10468237B2Nov 5, 2019
Substrate processing apparatus
TOKYO ELECTRON LTD3 citations73
US10049860B2Aug 14, 2018
Substrate processing apparatus
TOKYO ELECTRON LTD4 citations73
US9673078B2Jun 6, 2017
Cooling processing apparatus and method for operating the same
TOKYO ELECTRON LTD2 citations73
US11823879B2Nov 21, 2023
Film formation apparatus and film formation method
TOKYO ELECTRON LTD3 citations72
US9303788B2Apr 5, 2016
Load lock device
TOKYO ELECTRON LTD4 citations72
US10392688B2Aug 27, 2019
Film forming apparatus
TOKYO ELECTRON LTD4 citations71
US9790590B2Oct 17, 2017
Vacuum-processing apparatus, vacuum-processing method, and storage medium
TOKYO ELECTRON LTD6 citations71
US12170217B2Dec 17, 2024
Substrate processing apparatus and abnormality detection method
TOKYO ELECTRON LTD1 citations62
US12033878B2Jul 9, 2024
Substrate transfer apparatus and substrate processing system
TOKYO ELECTRON LTD0 citations62
US11542592B2Jan 3, 2023
Film forming system and method for forming film on substrate
TOKYO ELECTRON LTD1 citations61
US11193200B2Dec 7, 2021
PVD processing method and PVD processing apparatus
TOKYO ELECTRON LTD1 citations61
US12559835B2Feb 24, 2026
Film forming apparatus and film forming method
TOKYO ELECTRON LTD0 citations59
US12163215B2Dec 10, 2024
Film forming apparatus and film forming method
TOKYO ELECTRON LTD1 citations59
US12327744B2Jun 10, 2025
Substrate transfer device and substrate processing system
TOKYO ELECTRON LTD0 citations52
US12469723B2Nov 11, 2025
Substrate processing apparatus and abnormality detection method
TOKYO ELECTRON LTD0 citations51
US12002667B2Jun 4, 2024
Sputtering apparatus and method of controlling sputtering apparatus
TOKYO ELECTRON LTD0 citations51
US11901166B2Feb 13, 2024
Magnetron sputtering apparatus and magnetron sputtering method
TOKYO ELECTRON LTD0 citations51
US11410837B2Aug 9, 2022
Film-forming device
TOKYO ELECTRON LTD0 citations50
US12261078B2Mar 25, 2025
Processing method and processing apparatus
TOKYO ELECTRON LTD0 citations48
US10014145B2Jul 3, 2018
Vacuum exhaust method
TOKYO ELECTRON LTD0 citations48
US10325801B2Jun 18, 2019
Mounting table system, substrate processing apparatus, and temperature control method
TOKYO ELECTRON LTD0 citations37