Inventor

WONG LAWRENCE

US31 patents

⚠️ This page may combine multiple inventors who share the name “WONG LAWRENCE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WONG LAWRENCE

APPLIED MATERIALS INC

Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity

Method of differential counter electrode tuning in an RF plasma reactor

Independent control of RF phases of separate coils of an inductively coupled plasma reactor

Plasma reactor with reduced electrical skew using electrical bypass elements

Plasma processing apparatus

Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources

Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece

Multiple electrode substrate support assembly and phase control system

Method and apparatus for controlling plasma near the edge of a substrate

Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber

Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources

Real-time measurement of a surface charge profile of an electrostatic chuck

Method of real time in-situ chamber condition monitoring using sensors and RF communication

Method of real time in-situ chamber condition monitoring using sensors and RF communication

Method of multiple zone symmetric gas injection for inductively coupled plasma

Spatially discrete multi-loop RF-driven plasma source having plural independent zones

System and method for selective coil excitation in inductively coupled plasma processing reactors

INTEL CORP

Dual-damascene interconnects without an etch stop layer by alternating ILDs

Thin passivation layer on 3D devices

Structure in a microelectronic device including a bi-layer for a diffusion barrier and an etch-stop layer

Contact stacks to reduce hydrogen in thin film transistor

SIRIFIC WIRELESS CORP

Method and apparatus for down-conversion of radio frequency (RF) signals with reduced local oscillator leakage

Method and apparatus for up-and down-conversion of radio frequency (RF) signals

Method and apparatus for up-and-down-conversion of radio frequency (RF) signals

RAMASWAMY KARTIK

Apparatus for VHF impedance match tuning

Apparatus for characterizing a magnetic field in a magnetically enhanced substrate processing system

COLLINS KENNETH S

Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes

Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator

MCMAHON ANDREW

Method and system for generating and aggregating models based on disparate data from insurance, financial services, and public industries

VAN HEERDEN LAUREN

Systems and methods for providing balance notifications

NOKIA CORP

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