Inventor

BIRANG MANOOCHER

US167 patents

⚠️ This page may combine multiple inventors who share the name “BIRANG MANOOCHER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BIRANG MANOOCHER

APPLIED MATERIALS INC

Method for in-situ endpoint detection for chemical mechanical polishing operations

Method of forming a transparent window in a polishing pad

Apparatus and methods for chemical mechanical polishing with an advanceable polishing sheet

Carrier head with a flexible membrane for a chemical mechanical polishing system

In-situ monitoring of linear substrate polishing operations

Carrier head for chemical mechanical polishing a substrate

Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus

Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus

Endpoint detector for a chemical mechanical polishing system

Electrostatic chuck with conformal insulator film

Determination of position of sensor measurements during polishing

Closed-loop control of wafer polishing in a chemical mechanical polishing system

Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations

Method and apparatus for detecting polishing endpoint with optical monitoring

Method and apparatus for optical monitoring in chemical mechanical polishing

Method and apparatus for determining substrate layer thickness during chemical mechanical polishing

Apparatus and method for in-situ monitoring of chemical mechanical polishing operations

Apparatus and method to determine the coefficient of friction of a chemical mechanical polishing pad during a pad conditioning process and to use it to control the process

Apparatus and method for detecting surface roughness in a chemical polishing pad conditioning process

Polishing system with in-line and in-situ metrology

System for chemical mechanical planarization

Eddy current system for in-situ profile measurement

Eddy current sensing of metal removal for chemical mechanical polishing

Integrated endpoint detection system with optical and eddy current monitoring

Method and apparatus for monitoring a metal layer during chemical mechanical polishing

Method of forming a transparent window in a polishing pad

Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations

Linear polishing sheet with window

Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations

In-situ monitoring of linear substrate polishing operations

Retainers and non-abrasive liners used in chemical mechanical polishing

Adaptive endpoint detection for chemical mechanical polishing

Delivery of polishing agents in a wafer processing system

End effector for pad conditioning

Carrier head with local pressure control for a chemical mechanical polishing apparatus

Electrostatic chuck with fluid flow regulator

Method of making electrostatic chuck with conformal insulator film

Method of determining a dechucking voltage which nullifies a residual electrostatic force between an electrostatic chuck and a wafer

Releasing a workpiece from an electrostatic chuck

Releasing a workpiece from an electrostatic chuck

Method and apparatus for endpoint detection in a semiconductor wafer etching system

Method of fabricating an electrostatic chuck

Determining when to replace a retaining ring used in substrate polishing operations

Electrostatic chuck with improved erosion resistance

Electrostatic chuck with improved erosion resistance

Polishing pads useful for endpoint detection in chemical mechanical polishing

Monitoring a metal layer during chemical mechanical polishing

Substrate edge detection

Method of forming a polishing pad for endpoint detection

KATEEVA INC

Apparatus and method for control of print gap