Inventor

LEE CHEN-MING

TW107 patents

⚠️ This page may combine multiple inventors who share the name “LEE CHEN-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEE CHEN-MING

TAIWAN SEMICONDUCTOR MFG CO LTD

Prevention of contact bottom void in semiconductor fabrication

Method for fabricating self-aligned contact in a semiconductor device

Semiconductor device and manufacturing method thereof

Backside via with a low-k spacer

Backside via with a low-k spacer

Prevention of contact bottom void in semiconductor fabrication

Semiconductor device and method

Metal gate structure cutting process

Prevention of contact bottom void in semiconductor fabrication

Isolation features and methods of fabricating the same

Method for source/drain contact formation in semiconductor devices

Semiconductor device and a method for fabricating the same

Mask-less dual silicide process

Semiconductor transistor device having backside source/drain contact with a low-k spacer and method of forming the same

Semiconductor devices with backside via and methods thereof

Semiconductor device and method

Epitaxial source/drain structures for multigate devices and methods of fabricating thereof

Backside contact with air spacer

Semiconductor devices with backside via and methods thereof

Epitaxial source/drain structure and method

Fin field effect transistor (FinFET) device structure with protection layer and method for forming the same

Method of forming backside power rails

Silicide backside contact

Low-resistance contact plugs and method forming same

Semiconductor device and method

Parasitic capacitance reduction

Methods of forming air spacers in semiconductor devices

Method for forming source/drain contacts

Semiconductor device and a method for fabricating the same

Fin field effect transistor (finFET) device structure with protection layer and method for forming the same

Fin field effect transistor (finFET) device structure with capping layer and method for forming the same

Low-resistance contact plugs and method forming the same

Methods for reducing contact depth variation in semiconductor fabrication

Fin field effect transistor (FinFET) device structure with capping layer and method for forming the same

Method for fabricating self-aligned contact in a semiconductor device

Silicide structures in transistors and methods of forming

Semiconductor device and method

Methods of forming low resistance contacts

Source/drain contact structure

Source/drain features

Source/drain features

Semiconductor devices with backside via and methods thereof

Metal gate structure cutting process

Semiconductor device contact structures and methods of fabricating thereof

Contact profile optimization for IC device performance improvement

Isolation structure and a self-aligned capping layer formed thereon

Semiconductor devices

Fin field effect transistor (FinFET) device structure with protection layer and method for forming the same

TAIWAN SEMICONDUCTOR MFG

Methods of forming low resistance contacts

LIN CHE HSIEN

Electronic device