Inventor

PANDEV STILIAN IVANOV

US50 patents

⚠️ This page may combine multiple inventors who share the name “PANDEV STILIAN IVANOV”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

PANDEV STILIAN IVANOV

KLA TENCOR CORP

Integrated use of model-based metrology and a process model

Multi-location metrology

System, method and computer program product for combining raw data from multiple metrology tools

Statistical model-based metrology

Methods and systems for spectroscopic beam profile metrology having a first two dimensional detector to detect collected light transmitted by a first wavelength dispersive element

Compressive sensing for metrology

Differential methods and apparatus for metrology of semiconductor targets

Methods and apparatus for patterned wafer characterization

Metrology systems and methods for process control

Model based measurement systems with improved electromagnetic solver performance

Signal response metrology for image based and scatterometry overlay measurements

Measurement of multiple patterning parameters

Apparatus, techniques, and target designs for measuring semiconductor parameters

Measurement of multiple patterning parameters

Methods and apparatus for determining focus

Measurement model optimization based on parameter variations across a wafer

Spectroscopic beam profile overlay metrology

On-device metrology

Image based signal response metrology

Semiconductor metrology based on hyperspectral imaging

Process control metrology

Process robust overlay metrology based on optical scatterometry

Measurement of multiple patterning parameters

Model-based single parameter measurement

Model-based metrology using images

Measurement recipe optimization based on spectral sensitivity and process variation

System, method and computer program product for calibration of metrology tools

Metrology of multiple patterning processes

Signal response metrology based on measurements of proxy structures

Apparatus, techniques, and target designs for measuring semiconductor parameters

Methods and apparatus for determining focus

Measurement model optimization based on parameter variations across a wafer

Dynamic removal of correlation of highly correlated parameters for optical metrology

Metrology system optimization for parameter tracking

Measurement of small box size targets

Model-based hot spot monitoring

Model-based metrology using images

Signal response metrology for image based overlay measurements

Method and system for spectroscopic beam profile metrology including a detection of collected light according to wavelength along a third dimension of a hyperspectral detector

Compressive sensing for metrology

KLA CORP

Measurement recipe optimization based on probabilistic domain knowledge and physical realization

Methods and systems for determining quality of semiconductor measurements

Tomography based semiconductor measurements using simplified models

Overlay estimation based on optical inspection and machine learning

Semiconductor measurements with robust in-line tool matching

Methods and systems for measurement of tilt and overlay of a structure

High resolution profile measurement based on a trained parameter conditioned measurement model

Dynamic control of machine learning based measurement recipe optimization

KLA—TENCOR CORP

Signal response metrology for scatterometry based overlay measurements

PANDEV STILIAN IVANOV

Model optimization approach based on spectral sensitivity