Inventor
TAKASAKI KANETAKE
JP20 patents
Patents
20 patentsUS4539068ASep 3, 1985
Vapor phase growth method
FUJITSU LTD147 citations98
US5424243AJun 13, 1995
Method of making a compound semiconductor crystal-on-substrate structure
FUJITSU LTD58 citations96
US4581622AApr 8, 1986
UV erasable EPROM with UV transparent silicon oxynitride coating
FUJITSU LTD50 citations96
US4394401AJul 19, 1983
Method of plasma enhanced chemical vapor deposition of phosphosilicate glass film
FUJITSU LTD77 citations96
US5312783AMay 17, 1994
Process for the preparation of a high dielectric thin film using ECR plasma CVD
FUJITSU LTD48 citations92
US5210052AMay 11, 1993
Method for fabricating a semiconductor substrate
FUJITSU LTD33 citations92
US5107317AApr 21, 1992
Semiconductor device with first and second buffer layers
FUJITSU LTD33 citations92
US4532022AJul 30, 1985
Process of producing a semiconductor device
FUJITSU LTD41 citations92
US4384933AMay 24, 1983
Method of reactive sputtering
FUJITSU LTD28 citations92
US4363868ADec 14, 1982
Process of producing semiconductor devices by forming a silicon oxynitride layer by a plasma CVD technique which is employed in a selective oxidation process
FUJITSU LTD32 citations92
US6468926B1Oct 22, 2002
Manufacture method and system for semiconductor device with thin gate insulating film of oxynitride
FUJITSU LTD22 citations91
US4929985AMay 29, 1990
Compound semiconductor device
FUJITSU LTD21 citations82
US5019529AMay 28, 1991
Heteroepitaxial growth method
FUJITSU LTD16 citations74
US4741919AMay 3, 1988
Process for preparation of semiconductor device
FUJITSU LTD6 citations74
US4406053ASep 27, 1983
Process for manufacturing a semiconductor device having a non-porous passivation layer
FUJITSU LTD13 citations74
US5057880AOct 15, 1991
Semiconductor device having a heteroepitaxial substrate
FUJITSU LTD12 citations73
US6984267B2Jan 10, 2006
Manufacture system for semiconductor device with thin gate insulating film
FUJITSU LTD8 citations72
US4781945ANov 1, 1988
Process for the formation of phosphosilicate glass coating
FUJITSU LTD14 citations70
US5183778AFeb 2, 1993
Method of producing a semiconductor device
FUJITSU LTD4 citations63
US6780699B2Aug 24, 2004
Semiconductor device and method for fabricating the same
FUJITSU LTD5 citations61