Inventor
ABE JUN
JP71 patents
⚠️ This page may combine multiple inventors who share the name “ABE JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
10 patentsUS6564585B2May 20, 2003
Method for producing a second-order nonlinear glass material
SHINETSU CHEMICAL CO18 citations89
US7752869B2Jul 13, 2010
Optical fiber preform, method for manufacturing thereof, and optical fiber obtained by drawing thereof
SHINETSU CHEMICAL CO9 citations83
US6301412B1Oct 9, 2001
Apparatus and method for making multi-branching optical coupler
SHINETSU CHEMICAL CO15 citations80
US6157758ADec 5, 2000
Grating optical fiber, and optical fiber base material suitable for grating
SHINETSU CHEMICAL CO13 citations70
US11021810B2Jun 1, 2021
Lithium tantalate single crystal substrate, bonded substrate, manufacturing method of the bonded substrate, and surface acoustic wave device using the bonded substrate
SHINETSU CHEMICAL CO0 citations61
US5671309ASep 23, 1997
Wide-band optical fiber coupler and method for preparing the same
SHINETSU CHEMICAL CO4 citations61
US6681074B1Jan 20, 2004
Method for producing base material for optical fiber having deformed first clad, base material for optical fiber and optical fiber
SHINETSU CHEMICAL CO3 citations60
US6380109B1Apr 30, 2002
Second-order nonlinear glass material
SHINETSU CHEMICAL CO2 citations60
US6600857B1Jul 29, 2003
Grating optical fiber, and optical fiber base material suitable for grating
SHINETSU CHEMICAL CO3 citations59
US11814748B2Nov 14, 2023
Method for producing lithium tantalate single crystal substrate
SHINETSU CHEMICAL CO0 citations52
TOKYO ELECTRON LTD
7 patentsUS8703002B2Apr 22, 2014
Plasma processing apparatus, plasma processing method and storage medium
TOKYO ELECTRON LTD343 citations98
US9564287B2Feb 7, 2017
Substrate processing apparatus and substrate processing method using same
TOKYO ELECTRON LTD41 citations94
US11251048B2Feb 15, 2022
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD2 citations71
US12205801B2Jan 21, 2025
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD2 citations65
US9500537B2Nov 22, 2016
Temperature measurement apparatus and method
TOKYO ELECTRON LTD2 citations63
US7952717B2May 31, 2011
Temperature measuring apparatus and temperature measuring method
TOKYO ELECTRON LTD6 citations63
US12261027B2Mar 25, 2025
Plasma processing apparatus and plasma processing method
TOKYO ELECTRON LTD0 citations62
FUJI XEROX CO LTD
5 patentsUS5887233AMar 23, 1999
Photographic developing apparatus and electrifying apparatus
FUJI XEROX CO LTD19 citations84
US5463452AOct 31, 1995
Single-component developing apparatus
FUJI XEROX CO LTD9 citations73
US5247333ASep 21, 1993
One-component developing apparatus
FUJI XEROX CO LTD17 citations73
US5541736AJul 30, 1996
Color image forming system which conducts charging exposure and development with respect to a photosensitive medium at a plurality of times
FUJI XEROX CO LTD7 citations72
US8676097B2Mar 18, 2014
Developing device, assembly, and image forming apparatus with a biasing member
FUJI XEROX CO LTD3 citations63
ABE JUN
5 patentsUS8641117B2Feb 4, 2014
Assist grip for vehicle
ABE JUN4 citations69
US8708386B2Apr 29, 2014
Assist grip for vehicle
ABE JUN3 citations62
US8585284B2Nov 19, 2013
Temperature measurement apparatus and method
ABE JUN1 citations62
US8182142B2May 22, 2012
Temperature measuring apparatus and temperature measuring method
ABE JUN4 citations62
US8144332B2Mar 27, 2012
Temperature measurement apparatus and method
ABE JUN1 citations62
MITSUBA CORP
3 patentsIIZUKA HACHISHIRO
3 patentsHITACHI LTD
2 patentsHITACHI CABLE
2 patentsTOSHIBA KK
1 patentUI AKIO
1 patentOHSE TAKESHI
1 patentMACHIDA KEN
1 patentJGC CORP
1 patentNIKON CORP
1 patentMITSUBA ELECTRIC MFG CO
1 patentIKEDA MIHO
1 patentTOPCON CORP
1 patentMATSUDO TATSUO
1 patentFUJIWARA MASARU
1 patentWATANABE YOICHI
1 patentNAT JEWISH CT IMMUN & RESPIRAT
1 patentShowing the top 50 of 71 patents by PatentIndex Score.