Inventor

SHIRAISHI NAOMASA

JP107 patents

⚠️ This page may combine multiple inventors who share the name “SHIRAISHI NAOMASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHIRAISHI NAOMASA

NIKON CORP

Exposure apparatus and exposure method, and device manufacturing method

Projection exposure method and apparatus

Projection exposure apparatus

Projection exposure method and apparatus

Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure

Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus

Position-detection method and apparatus with a grating mark

Projection exposure apparatus

Method and apparatus for increasing the resolution power of projection lithography exposure system

Projection exposure apparatus

Projection exposure apparatus and method

Projection exposure method and apparatus

Projection apparatus and method

Photo-mask and method of exposing and projection-exposing apparatus

Exposure method utilizing diffracted light having different orders of diffraction

Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns

Projection exposure apparatus

Projection exposure apparatus

High resolution printing technique by using improved mask pattern and improved illumination system

Device for positioning circular semiconductor wafers

Adjusting method for position detecting apparatus

Projection exposure apparatus

Projection exposure apparatus

Exposure apparatus and method preheating a mask before exposing; a conveyance method preheating a mask before exposing; and a device manufacturing system and method manufacturing a device according to the exposure apparatus and method

Mark detection method, optical system and mark position detector

Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus

Projection exposure apparatus and method

Exposure method and apparatus therefor

Illumination optical apparatus using different number of light sources under different exposure modes, method of operating and method of manufacturing thereof

Mark for position detection, and mark detecting method and apparatus

Illumination optical apparatus and method having a wavefront splitter and an optical integrator

Apparatus for detecting a mark pattern on a substrate

Projection-exposing apparatus with deflecting grating member

Method and apparatus for inspecting a phase-shifted mask

Projection exposure method and apparatus

Apparatus and method for projection exposure

Projection type light exposure apparatus and light exposure method

Projection type exposure apparatus and method of exposure

Projection exposure apparatus

Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus

Exposure apparatus and exposure method

Projection exposure apparatus and method

Optical system and exposure apparatus having the optical system

Exposure method and apparatus

Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane

Temperature control method and exposure apparatus thereby

Photomask producing method and apparatus and device manufacturing method

Method of detecting position of mark on substrate, position detection apparatus using this method, and exposure apparatus using this position detection apparatus

(unassigned)

Exposure method and apparatus, and method of fabricating a device

NIPPON KOGAKU KK

Projection exposure apparatus