Inventor
MCCULLOUGH ANDREW W
US23 patents
⚠️ This page may combine multiple inventors who share the name “MCCULLOUGH ANDREW W”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SVG LITHOGRAPHY SYSTEMS INC
11 patentsUS5895737AApr 20, 1999
Method for adjusting an illumination field based on selected reticle feature
SVG LITHOGRAPHY SYSTEMS INC49 citations96
US6259513B1Jul 10, 2001
Illumination system with spatially controllable partial coherence
SVG LITHOGRAPHY SYSTEMS INC57 citations94
US6097474AAug 1, 2000
Dynamically adjustable high resolution adjustable slit
SVG LITHOGRAPHY SYSTEMS INC55 citations94
US6013401AJan 11, 2000
Method of controlling illumination field to reduce line width variation
SVG LITHOGRAPHY SYSTEMS INC78 citations94
US6445439B1Sep 3, 2002
EUV reticle thermal management
SVG LITHOGRAPHY SYSTEMS INC31 citations92
US6292255B1Sep 18, 2001
Dose correction for along scan linewidth variation
SVG LITHOGRAPHY SYSTEMS INC51 citations92
US5973764AOct 26, 1999
Vacuum assisted debris removal system
SVG LITHOGRAPHY SYSTEMS INC32 citations92
US5966202AOct 12, 1999
Adjustable slit
SVG LITHOGRAPHY SYSTEMS INC33 citations92
US5896188AApr 20, 1999
Reduction of pattern noise in scanning lithographic system illuminators
SVG LITHOGRAPHY SYSTEMS INC31 citations92
US5767523AJun 16, 1998
Multiple detector alignment system for photolithography
SVG LITHOGRAPHY SYSTEMS INC29 citations92
US6444372B1Sep 3, 2002
Non absorbing reticle and method of making same
SVG LITHOGRAPHY SYSTEMS INC11 citations74
ASML HOLDING NV
9 patentsUS6822728B2Nov 23, 2004
Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system
ASML HOLDING NV15 citations92
US6800408B2Oct 5, 2004
Use of multiple reticles in lithographic printing tools
ASML HOLDING NV15 citations89
US7092070B2Aug 15, 2006
Illumination system with spatially controllable partial coherence compensating for line width variances
ASML HOLDING NV6 citations74
US7029804B2Apr 18, 2006
Non absorbing reticle and method of making same
ASML HOLDING NV4 citations74
US6686101B2Feb 3, 2004
Non absorbing reticle and method of making same
ASML HOLDING NV7 citations74
US7105836B2Sep 12, 2006
Method and apparatus for cooling a reticle during lithographic exposure
ASML HOLDING NV10 citations73
US6967713B2Nov 22, 2005
Use of multiple reticles in lithographic printing tools
ASML HOLDING NV7 citations73
US7014963B2Mar 21, 2006
Non absorbing reticle and method of making same
ASML HOLDING NV0 citations52
US7403266B2Jul 22, 2008
Maskless lithography systems and methods utilizing spatial light modulator arrays
ASML HOLDING NV1 citations48