Inventor
GALBURT DANIEL N
US39 patents
⚠️ This page may combine multiple inventors who share the name “GALBURT DANIEL N”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML HOLDING NV
27 patentsUS6760167B2Jul 6, 2004
Apparatus, system, and method for precision positioning and alignment of a lens in an optical system
ASML HOLDING NV42 citations93
US6912043B2Jun 28, 2005
Removable reticle window and support frame using magnetic force
ASML HOLDING NV35 citations92
US6784978B2Aug 31, 2004
Method, system, and apparatus for management of reaction loads in a lithography system
ASML HOLDING NV19 citations92
US7053990B2May 30, 2006
System to increase throughput in a dual substrate stage double exposure lithography system
ASML HOLDING NV17 citations91
US6906789B2Jun 14, 2005
Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion
ASML HOLDING NV24 citations91
US7010958B2Mar 14, 2006
High-resolution gas gauge proximity sensor
ASML HOLDING NV21 citations89
US7196775B2Mar 27, 2007
Patterned mask holding device and method using two holding systems
ASML HOLDING NV11 citations84
US7134321B2Nov 14, 2006
Fluid gauge proximity sensor and method of operating same using a modulated fluid flow
ASML HOLDING NV15 citations82
US7292308B2Nov 6, 2007
System and method for patterning a flexible substrate in a lithography tool
ASML HOLDING NV11 citations80
US7042554B2May 9, 2006
Removable reticle window and support frame using magnetic force
ASML HOLDING NV9 citations74
US6885435B2Apr 26, 2005
Method, system, and apparatus for management of reaction loads in a lithography system
ASML HOLDING NV10 citations74
US7105836B2Sep 12, 2006
Method and apparatus for cooling a reticle during lithographic exposure
ASML HOLDING NV10 citations73
US7372548B2May 13, 2008
Levitated reticle-masking blade stage
ASML HOLDING NV5 citations72
US7021121B2Apr 4, 2006
Gas gauge proximity sensor with a modulated gas flow
ASML HOLDING NV7 citations72
US7437911B2Oct 21, 2008
Method and system for operating an air gauge at programmable or constant standoff
ASML HOLDING NV8 citations71
US7124624B2Oct 24, 2006
High-resolution gas gauge proximity sensor
ASML HOLDING NV10 citations71
US7369214B2May 6, 2008
Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors
ASML HOLDING NV6 citations63
US7176593B2Feb 13, 2007
Actuator coil cooling system
ASML HOLDING NV3 citations63
US7075623B2Jul 11, 2006
Flexure-supported split reaction mass
ASML HOLDING NV5 citations63
US6989889B2Jan 24, 2006
Method, system, and apparatus for management of reaction loads in a lithography system
ASML HOLDING NV1 citations63
US6946761B2Sep 20, 2005
Actuator coil cooling system
ASML HOLDING NV2 citations63
US7164463B2Jan 16, 2007
Lithographic tool with dual isolation system and method for configuring the same
ASML HOLDING NV2 citations62
US7158213B2Jan 2, 2007
Lithographic tool with dual isolation system and method for configuring the same
ASML HOLDING NV2 citations62
US7050156B2May 23, 2006
Method to increase throughput in a dual substrate stage double exposure lithography system
ASML HOLDING NV2 citations61
US6950175B2Sep 27, 2005
System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanism
ASML HOLDING NV5 citations61
US7797985B2Sep 21, 2010
Method and system for operating an air gauge at programmable or constant standoff
ASML HOLDING NV2 citations60
USRE42650EAug 30, 2011
Fluid gauge proximity sensor and method of operating same using a modulated fluid flow
ASML HOLDING NV0 citations51
SVG LITHOGRAPHY SYSTEMS INC
5 patentsUS6097474AAug 1, 2000
Dynamically adjustable high resolution adjustable slit
SVG LITHOGRAPHY SYSTEMS INC55 citations94
US6013401AJan 11, 2000
Method of controlling illumination field to reduce line width variation
SVG LITHOGRAPHY SYSTEMS INC78 citations94
US5285142AFeb 8, 1994
Wafer stage with reference surface
SVG LITHOGRAPHY SYSTEMS INC92 citations94
US5966216AOct 12, 1999
On-axix mask and wafer alignment system
SVG LITHOGRAPHY SYSTEMS INC32 citations92
US5352962AOct 4, 1994
Brushless polyphase reduced force variation motor
SVG LITHOGRAPHY SYSTEMS INC22 citations92