Inventor

BLAKENEY ANDREW J

US44 patents

⚠️ This page may combine multiple inventors who share the name “BLAKENEY ANDREW J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BLAKENEY ANDREW J

ARCH SPEC CHEM INC

Photosensitive polybenzoxazole precursor compositions

Photoacid generators for use in photoresist compositions

Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations

Radiation sensitive terpolymer, photoresist compositions thereof and 193 nm bilayer systems

Hydroxy-amino thermally cured undercoat of 193 nm lithography

Hydroxy-epoxide thermally cured undercoat for 193 NM lithography

Hydroxy-amino thermally cured undercoat for 193 NM lithography

Hydroxy-diisocyanate thermally cured undercoat for 193 nm lithography

Thermally cured underlayer for lithographic application

Thermally cured underlayer for lithographic application

Silicon-containing acetal protected polymers and photoresists compositions thereof

Radiation sensitive compositions containing image quality and profile enhancement additives

Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations

Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations

Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures

Hydroxy-amino thermally cured undercoat for 193 nm lithography

OCG MICROELECTRONIC MATERIALS

Selected O-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions

O-quinonediazide sulfonic acid esters of phenolic compounds and their use in forming positive images

Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions

Photoresist developer containing fluorinated amphoteric surfactant

Selected block phenolic oligomers and their use in radiation-sensitive resist compositions

Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions

Selected block copolymer novolak binder resins

Process of developing an image-wise exposed resist-coated substrate

Selected block phenolic oligomers and their use in phenolic resin compositions and in radiation-sensitive resist compositions

Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin used in a method of forming a positive photoresist image

Thermally stable phenolic resin compositions and their use in light-sensitive compositions

Selected block copolymer novolak binder resins in radiation-sensitive resist compositions

OLIN HUNT SPECIALTY PROD

Thermally stable light-sensitive compositions with o-quinone diazide and phenolic resin

Process of forming resist image in positive photoresist with thermally stable phenolic resin

Process of developing a radiation imaged product with trinuclear novolak oligomer having o-naphthoquinone diazide sulfonyl group

Selected trinuclear novolak oligomers and their use in photoactive compounds and radiation sensitive mixtures

Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group

Thermally stable phenolic resin compositions with ortho, ortho methylene linkage

Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde

OLIN MICROELECTRONIC CHEM INC

Selected high thermal novolaks and positive-working radiation-sensitive compositions

Process for preparing a radiation-sensitive composition

Chemical imidization reagent for polyimide synthesis

Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures

Process for making polyimide-polyamic ester copolymers

Process for making polyimides from diamines and tetracarboxylic diacid diester

ARCH CHEM INC

Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulations

PETRARCH SYSTEMS INC

High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants

PETRARCH SYSTEM INC

Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant