Inventor
HADA HIDEO
JP94 patents
⚠️ This page may combine multiple inventors who share the name “HADA HIDEO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
45 patentsUS7323287B2Jan 29, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD77 citations99
US7074543B2Jul 11, 2006
Positive resist composition and method of forming resist pattern from the same
TOKYO OHKA KOGYO CO LTD151 citations99
US7713679B2May 11, 2010
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD57 citations98
US6063953AMay 16, 2000
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD90 citations98
US5714625AFeb 3, 1998
Cyanooxime sulfonate compound
TOKYO OHKA KOGYO CO LTD143 citations98
US7482108B2Jan 27, 2009
Polymer compound, acid generator, positive resist composition, and method for formation of resist patterns
TOKYO OHKA KOGYO CO LTD92 citations97
US6444397B2Sep 3, 2002
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD39 citations96
US6897012B2May 24, 2005
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD13 citations93
US6388101B1May 14, 2002
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD42 citations93
US6087063AJul 11, 2000
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD37 citations93
US5929271AJul 27, 1999
Compounds for use in a positive-working resist composition
TOKYO OHKA KOGYO CO LTD26 citations93
US7682772B2Mar 23, 2010
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD20 citations92
US7504196B2Mar 17, 2009
Positive resist composition, method for resist pattern formation and compound
TOKYO OHKA KOGYO CO LTD21 citations92
US6022666AFeb 8, 2000
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD21 citations92
US5902713AMay 11, 1999
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD23 citations92
US5800964ASep 1, 1998
Photoresist composition
TOKYO OHKA KOGYO CO LTD20 citations92
US7527909B2May 5, 2009
Resist composition
TOKYO OHKA KOGYO CO LTD9 citations84
US7501220B2Mar 10, 2009
Resist composition
TOKYO OHKA KOGYO CO LTD9 citations84
US6749989B2Jun 15, 2004
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD16 citations84
US7927780B2Apr 19, 2011
Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
TOKYO OHKA KOGYO CO LTD9 citations83
US7776510B2Aug 17, 2010
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD14 citations83
US5976760ANov 2, 1999
Chemical-sensitization resist composition
TOKYO OHKA KOGYO CO LTD16 citations82
US8012669B2Sep 6, 2011
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD15 citations80
US7435530B2Oct 14, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD5 citations74
US7183368B2Feb 27, 2007
Negative-working photoresist composition
TOKYO OHKA KOGYO CO LTD7 citations74
US6759176B2Jul 6, 2004
Positive-working resist composition
TOKYO OHKA KOGYO CO LTD10 citations74
US6245930B1Jun 12, 2001
Chemical-sensitization resist composition
TOKYO OHKA KOGYO CO LTD9 citations74
US6225476B1May 1, 2001
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD6 citations74
US6077644AJun 20, 2000
Positive-working resist composition
TOKYO OHKA KOGYO CO LTD7 citations74
US5892095AApr 6, 1999
Cyano group-containing oxime sulfonate compounds
TOKYO OHKA KOGYO CO LTD8 citations74
US7592123B2Sep 22, 2009
Resin for photoresist composition, photoresist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD5 citations73
US7541138B2Jun 2, 2009
Resist composition
TOKYO OHKA KOGYO CO LTD6 citations73
US7488568B2Feb 10, 2009
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD7 citations73
US7771911B2Aug 10, 2010
Process for producing photoresist composition, filter, coater and photoresist composition
TOKYO OHKA KOGYO CO LTD7 citations69
US7851129B2Dec 14, 2010
Resist composition, resist pattern forming method and compound
TOKYO OHKA KOGYO CO LTD2 citations63
US7745097B2Jun 29, 2010
Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations63
US7494759B2Feb 24, 2009
Positive resist compositions and process for the formation of resist patterns with the same
TOKYO OHKA KOGYO CO LTD2 citations63
US7316889B2Jan 8, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD2 citations63
US7316885B2Jan 8, 2008
Method of forming resist pattern, positive resist composition, and layered product
TOKYO OHKA KOGYO CO LTD6 citations63
US7316888B2Jan 8, 2008
Positive type resist composition and resist pattern formation method using same
TOKYO OHKA KOGYO CO LTD2 citations63
US5990338ANov 23, 1999
Negative-working chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD1 citations63
US5973187AOct 26, 1999
Positive-working chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD1 citations63
US7932013B2Apr 26, 2011
Pattern coating material and pattern forming method
TOKYO OHKA KOGYO CO LTD3 citations62
US7879528B2Feb 1, 2011
Resist composition for electron beam or EUV
TOKYO OHKA KOGYO CO LTD2 citations62
US7851127B2Dec 14, 2010
Polymer compound, positive resist composition and resist pattern forming method
TOKYO OHKA KOGYO CO LTD2 citations62
TOKYO OHKA KOGYO LTD
1 patentKAWAUE AKIYA
1 patentSESHIMO TAKEHIRO
1 patentYONEMURA KOJI
1 patentIWAI TAKESHI
1 patentShowing the top 50 of 94 patents by PatentIndex Score.