Inventor
SATO KAZUFUMI
JP44 patents
⚠️ This page may combine multiple inventors who share the name “SATO KAZUFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
38 patentsUS5945517AAug 31, 1999
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD305 citations96
US5736296AApr 7, 1998
Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound
TOKYO OHKA KOGYO CO LTD46 citations96
US6388101B1May 14, 2002
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD42 citations93
US6087063AJul 11, 2000
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD37 citations93
US5929271AJul 27, 1999
Compounds for use in a positive-working resist composition
TOKYO OHKA KOGYO CO LTD26 citations93
US6387587B1May 14, 2002
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD22 citations92
US5955240ASep 21, 1999
Positive resist composition
TOKYO OHKA KOGYO CO LTD23 citations92
US5948589ASep 7, 1999
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD20 citations92
US5908730AJun 1, 1999
Chemical-sensitization photoresist composition
TOKYO OHKA KOGYO CO LTD35 citations92
US5817444AOct 6, 1998
Positive-working photoresist composition and multilayered resist material using the same
TOKYO OHKA KOGYO CO LTD35 citations92
US6255041B1Jul 3, 2001
Method for formation of patterned resist layer
TOKYO OHKA KOGYO CO LTD16 citations83
US5976760ANov 2, 1999
Chemical-sensitization resist composition
TOKYO OHKA KOGYO CO LTD16 citations82
US5770343AJun 23, 1998
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD15 citations82
US6245930B1Jun 12, 2001
Chemical-sensitization resist composition
TOKYO OHKA KOGYO CO LTD9 citations74
US6225476B1May 1, 2001
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD6 citations74
US6077644AJun 20, 2000
Positive-working resist composition
TOKYO OHKA KOGYO CO LTD7 citations74
US6284430B1Sep 4, 2001
Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same
TOKYO OHKA KOGYO CO LTD8 citations73
US6159652ADec 12, 2000
Positive resist composition
TOKYO OHKA KOGYO CO LTD12 citations73
US5945248AAug 31, 1999
Chemical-sensitization positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD14 citations73
US5874195AFeb 23, 1999
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD9 citations73
US6638684B2Oct 28, 2003
Photosensitive laminate, process for forming resist pattern using same and positive resist composition
TOKYO OHKA KOGYO CO LTD7 citations72
US12099298B2Sep 24, 2024
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations62
US6890697B2May 10, 2005
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations62
US6869745B2Mar 22, 2005
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations62
US6818380B2Nov 16, 2004
Method for the preparation of a semiconductor device
TOKYO OHKA KOGYO CO LTD4 citations62
US6815144B2Nov 9, 2004
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations62
US6787290B2Sep 7, 2004
Positive-working photoresist composition and resist patterning method using same
TOKYO OHKA KOGYO CO LTD6 citations62
US6777158B2Aug 17, 2004
Method for the preparation of a semiconductor device
TOKYO OHKA KOGYO CO LTD3 citations62
US6673516B2Jan 6, 2004
Coating composition for chemically amplified positive resist and method of patterning resist using the same
TOKYO OHKA KOGYO CO LTD4 citations62
US6444394B1Sep 3, 2002
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD5 citations62
US5856058AJan 5, 1999
Chemical-sensitization positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD2 citations62
US5854357ADec 29, 1998
Process for the production of polyhydroxstyrene
TOKYO OHKA KOGYO CO LTD3 citations62
US7666569B2Feb 23, 2010
Positive resist composition and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD6 citations61
US6773863B2Aug 10, 2004
Positive-working chemical-amplification photoresist composition
TOKYO OHKA KOGYO CO LTD0 citations51
US6677103B2Jan 13, 2004
Positive-working photoresist composition
TOKYO OHKA KOGYO CO LTD1 citations51
US6548229B2Apr 15, 2003
Positive-working chemical-amplification photoresist composition and method for forming a resist pattern using the same
TOKYO OHKA KOGYO CO LTD0 citations51
USRE38254ESep 16, 2003
Positive resist composition
TOKYO OHKA KOGYO CO LTD1 citations48
US9964851B2May 8, 2018
Resist pattern forming method and developer for lithography
TOKYO OHKA KOGYO CO LTD0 citations41