Inventor
GRANIK YURI
US31 patents
⚠️ This page may combine multiple inventors who share the name “GRANIK YURI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MENTOR GRAPHICS CORP
14 patentsUS7987434B2Jul 26, 2011
Calculation system for inverse masks
MENTOR GRAPHICS CORP20 citations92
US7378202B2May 27, 2008
Grid-based resist simulation
MENTOR GRAPHICS CORP39 citations92
US11061373B1Jul 13, 2021
Method and system for calculating probability of success or failure for a lithographic process due to stochastic variations of the lithographic process
MENTOR GRAPHICS CORP12 citations82
US7805699B2Sep 28, 2010
Shape-based photolithographic model calibration
MENTOR GRAPHICS CORP8 citations79
US8037429B2Oct 11, 2011
Model-based SRAF insertion
MENTOR GRAPHICS CORP18 citations76
US9032357B1May 12, 2015
Generating guiding patterns for directed self-assembly
MENTOR GRAPHICS CORP6 citations73
US8799832B1Aug 5, 2014
Optical proximity correction for topographically non-uniform substrates
MENTOR GRAPHICS CORP5 citations72
US9330228B2May 3, 2016
Generating guiding patterns for directed self-assembly
MENTOR GRAPHICS CORP4 citations69
US8788982B2Jul 22, 2014
Layout design defect repair using inverse lithography
MENTOR GRAPHICS CORP5 citations65
US9418195B2Aug 16, 2016
Layout content analysis for source mask optimization acceleration
MENTOR GRAPHICS CORP2 citations59
US8843859B2Sep 23, 2014
Layout content analysis for source mask optimization acceleration
MENTOR GRAPHICS CORP2 citations59
US10248028B2Apr 2, 2019
Source optimization for image fidelity and throughput
MENTOR GRAPHICS CORP0 citations52
US9355201B2May 31, 2016
Density-based integrated circuit design adjustment
MENTOR GRAPHICS CORP0 citations52
US9678435B1Jun 13, 2017
Horizontal development bias in negative tone development of photoresist
MENTOR GRAPHICS CORP1 citations51
GRANIK YURI
9 patentsUS7237221B2Jun 26, 2007
Matrix optical process correction
GRANIK YURI80 citations97
US7623220B2Nov 24, 2009
Source optimization for image fidelity and throughput
GRANIK YURI21 citations92
US7552416B2Jun 23, 2009
Calculation system for inverse masks
GRANIK YURI24 citations92
US7487489B2Feb 3, 2009
Calculation system for inverse masks
GRANIK YURI33 citations92
US7392168B2Jun 24, 2008
Method of compensating for etch effects in photolithographic processing
GRANIK YURI19 citations92
US7245354B2Jul 17, 2007
Source optimization for image fidelity and throughput
GRANIK YURI32 citations92
US8434031B2Apr 30, 2013
Inverse mask design and correction for electronic design
GRANIK YURI17 citations84
US9323161B2Apr 26, 2016
Source optimization by assigning pixel intensities for diffractive optical element using mathematical relationship
GRANIK YURI2 citations63
US8464185B2Jun 11, 2013
Electron beam simulation corner correction for optical lithography
GRANIK YURI2 citations63