Inventor

RAINA KANWAL K

US39 patents

⚠️ This page may combine multiple inventors who share the name “RAINA KANWAL K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RAINA KANWAL K

MICRON TECHNOLOGY INC

Deposition of smooth aluminum films

Display device with silicon-containing adhesion layer

Methods of manufacturing microelectronic substrate assemblies for use in planarization processes

Field emission device with silicon-containing adhesion layer

Electron emission devices and field emission display devices having buffer layer of microcrystalline silicon

Field emission device with buffer layer and method of making

Nitrogen and phosphorus doped amorphous silicon as resistor for field emission device baseplate

Suppression of hillock formation in thin aluminum films

Field emission display cathode assembly government rights

Method of forming resistor with adhesion layer for electron emission device

Field emission display with smooth aluminum film

Deposition of smooth aluminum films

Electron emission apparatus

Field emission display cathode assembly with gate buffer layer

Method of making a field emission device with buffer layer

Method of using hydrogen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom

Method of using hydrogen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom

Suppression of hillock formation in thin aluminum films

Method of making a field emission device with silicon-containing adhesion layer

Method of using hydrogen and oxygen gas in sputter deposition of aluminum-containing films and aluminum-containing films derived therefrom

Aluminum-containing films derived from using hydrogen and oxygen gas in sputter deposition

Method of forming nitrogen and phosphorus doped amorphous silicon as resistor for field emission display device baseplate

Aluminum-containing film derived from using hydrogen and oxygen gas in sputter deposition

Method of forming substantially hillock-free aluminum-containing components

Substantially hillock-free aluminum-containing components

Methods for forming field emission display devices

Methods for forming field emission display devices

Aluminum-containing films derived from using hydrogen and oxygen gas in sputter deposition

Field emission display with smooth aluminum film

Method to increase the emission current in FED displays through the surface modification of the emitters

Field emission display device

Field emission display with smooth aluminum film

Field emission display cathode assembly

Microelectronic substrate assemblies having elements in low compression state

Nitrogen and phosphorus doped amorphous silicon as resistor for field emission display device baseplate

Nitrogen and phosphorus doped amorphous silicon as resistor for field emission display device baseplate

TEXAS A & M UNIV SYS

Method for forming SbSI thin films

Epitaxial layers of 2122 BCSCO superconductor thin films having single crystalline structure

Method and system for forming SbSI thin films