Inventor
KIM SEONG-SUE
KR43 patents
⚠️ This page may combine multiple inventors who share the name “KIM SEONG-SUE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
30 patentsUS7301884B2Nov 27, 2007
Method of and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD42 citations96
US7821714B1Oct 26, 2010
Apparatus and method for measuring aerial image of EUV mask
SAMSUNG ELECTRONICS CO LTD15 citations92
US7295505B2Nov 13, 2007
Method of and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD3 citations74
US7274647B2Sep 25, 2007
Method of and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD6 citations74
US10338477B2Jul 2, 2019
Lithography apparatus
SAMSUNG ELECTRONICS CO LTD2 citations73
US9588413B2Mar 7, 2017
Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device
SAMSUNG ELECTRONICS CO LTD3 citations73
US10915015B2Feb 9, 2021
EUV mask blank, photomask manufactured by using the EUV mask blank, lithography apparatus using the photomask and method of fabricating semiconductor device using the photomask
SAMSUNG ELECTRONICS CO LTD2 citations68
US7807318B2Oct 5, 2010
Reflective photomask and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD3 citations63
US7724628B2May 25, 2010
Method and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD2 citations63
US7693023B2Apr 6, 2010
Method and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD2 citations63
US7447129B2Nov 4, 2008
Method of recording erase pattern information on an optical recording medium, erasing information on the optical recording medium based on the erase pattern information, and optical recording medium therefor.
SAMSUNG ELECTRONICS CO LTD2 citations63
US7411880B2Aug 12, 2008
Method of recording erase pattern information on an optical recording medium, erasing information on the optical recording medium based on the erase pattern information, and optical recording medium therefor
SAMSUNG ELECTRONICS CO LTD2 citations63
US7388824B2Jun 17, 2008
Method of and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD2 citations63
US7369470B2May 6, 2008
Method of recording erase pattern information on an optical recording medium, erasing information on the optical recording medium based on the erase pattern information, and optical recording medium therefor
SAMSUNG ELECTRONICS CO LTD1 citations63
US7359301B2Apr 15, 2008
Method of and apparatus for recording data on an optical recording medium
SAMSUNG ELECTRONICS CO LTD4 citations63
US7349306B2Mar 25, 2008
Method of recording erase pattern information on an optical recording medium, erasing information on the optical recording medium based on the erase pattern information, and optical recording medium therefor
SAMSUNG ELECTRONICS CO LTD2 citations63
US7342860B2Mar 11, 2008
Method and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD1 citations63
US7336588B2Feb 26, 2008
Method of and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD1 citations63
US7280460B2Oct 9, 2007
Method of and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD2 citations63
US6395366B1May 28, 2002
Phase change optical disc
SAMSUNG ELECTRONICS CO LTD3 citations63
US11372322B2Jun 28, 2022
EUV mask blank, photomask manufactured by using the EUV mask blank, lithography apparatus using the photomask and method of fabricating semiconductor device using the photomask
SAMSUNG ELECTRONICS CO LTD0 citations56
US9465286B2Oct 11, 2016
Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device
SAMSUNG ELECTRONICS CO LTD1 citations52
US9170480B2Oct 27, 2015
Reflective extreme ultraviolet mask and method of forming a pattern using the same
SAMSUNG ELECTRONICS CO LTD1 citations52
US7525890B2Apr 28, 2009
Method of and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD0 citations52
US7376064B2May 20, 2008
Method and apparatus for recording data on optical recording medium
SAMSUNG ELECTRONICS CO LTD0 citations52
US7173888B2Feb 6, 2007
Recording apparatus for and method of improving overwrite characteristics
SAMSUNG ELECTRONICS CO LTD0 citations52
US6226251B1May 1, 2001
Signal detection method of a phase-change optical disk
SAMSUNG ELECTRONICS CO LTD0 citations52
US8779403B2Jul 15, 2014
Apparatus and method for generating extreme ultra violet radiation
SAMSUNG ELECTRONICS CO LTD1 citations48
US8018817B2Sep 13, 2011
Method of recording erase pattern information on an optical recording medium, erasing information on the optical recording medium based on the erase pattern information, and optical recording medium therefor
SAMSUNG ELECTRONICS CO LTD0 citations42
US7095703B2Aug 22, 2006
Apparatus and method for recording mark
SAMSUNG ELECTRONICS CO LTD0 citations42
LEE DONG-GUN
8 patentsUS8335039B2Dec 18, 2012
Method of measuring aerial image of EUV mask
LEE DONG-GUN1 citations62
US8335038B2Dec 18, 2012
Apparatus for measuring aerial image of EUV mask
LEE DONG-GUN3 citations62
US8138483B2Mar 20, 2012
Method of measuring phase of phase shift mask
LEE DONG-GUN2 citations62
US9025624B2May 5, 2015
Beam generator
LEE DONG-GUN3 citations61
US8637840B2Jan 28, 2014
EUV projection lens and optic system having the same
LEE DONG-GUN2 citations61
US8470500B2Jun 25, 2013
Reflective extreme ultraviolet mask
LEE DONG-GUN0 citations51
US8119309B2Feb 21, 2012
Reflective photomask and method of fabricating, reflective illumination system and method of process using the same
LEE DONG-GUN0 citations51
US8422760B2Apr 16, 2013
System for monitoring haze of a photomask
LEE DONG-GUN0 citations49