Inventor
DERDERIAN GARO J
US156 patents
Patents
50 patentsUS7838084B2Nov 23, 2010
Atomic layer deposition method of depositing an oxide on a substrate
MICRON TECHNOLOGY INC528 citations99
US7589029B2Sep 15, 2009
Atomic layer deposition and conversion
MICRON TECHNOLOGY INC534 citations99
US7431966B2Oct 7, 2008
Atomic layer deposition method of depositing an oxide on a substrate
MICRON TECHNOLOGY INC538 citations99
US6967154B2Nov 22, 2005
Enhanced atomic layer deposition
MICRON TECHNOLOGY INC106 citations99
US6890596B2May 10, 2005
Deposition methods
MICRON TECHNOLOGY INC418 citations99
US6458416B1Oct 1, 2002
Deposition methods
MICRON TECHNOLOGY INC107 citations99
US6420230B1Jul 16, 2002
Capacitor fabrication methods and capacitor constructions
MICRON TECHNOLOGY INC138 citations99
US6355561B1Mar 12, 2002
ALD method to improve surface coverage
MICRON TECHNOLOGY INC335 citations99
US6297527B1Oct 2, 2001
Multilayer electrode for ferroelectric and high dielectric constant capacitors
MICRON TECHNOLOGY INC97 citations99
US6188097B1Feb 13, 2001
Rough electrode (high surface area) from Ti and TiN
MICRON TECHNOLOGY INC90 citations99
US6165834ADec 26, 2000
Method of forming capacitors, method of processing dielectric layers, method of forming a DRAM cell
MICRON TECHNOLOGY INC199 citations99
US7387685B2Jun 17, 2008
Apparatus and method for depositing materials onto microelectronic workpieces
MICRON TECHNOLOGY INC502 citations98
US6844260B2Jan 18, 2005
Insitu post atomic layer deposition destruction of active species
MICRON TECHNOLOGY INC104 citations98
US6627260B2Sep 30, 2003
Deposition methods
MICRON TECHNOLOGY INC77 citations98
US6821347B2Nov 23, 2004
Apparatus and method for depositing materials onto microelectronic workpieces
MICRON TECHNOLOGY INC94 citations97
US6673701B1Jan 6, 2004
Atomic layer deposition methods
MICRON TECHNOLOGY INC223 citations97
US7279732B2Oct 9, 2007
Enhanced atomic layer deposition
MICRON TECHNOLOGY INC58 citations96
US7271077B2Sep 18, 2007
Deposition methods with time spaced and time abutting precursor pulses
MICRON TECHNOLOGY INC82 citations96
US6900497B2May 31, 2005
Integrated circuit with a capacitor comprising an electrode
MICRON TECHNOLOGY INC43 citations96
US6797337B2Sep 28, 2004
Method for delivering precursors
MICRON TECHNOLOGY INC60 citations96
US6780766B2Aug 24, 2004
Methods of forming regions of differing composition over a substrate
MICRON TECHNOLOGY INC46 citations96
US6780758B1Aug 24, 2004
Method of establishing electrical contact between a semiconductor substrate and a semiconductor device
MICRON TECHNOLOGY INC54 citations96
US6777739B2Aug 17, 2004
Multilayer electrode for a ferroelectric capacitor
MICRON TECHNOLOGY INC42 citations96
US6753271B2Jun 22, 2004
Atomic layer deposition methods
MICRON TECHNOLOGY INC40 citations96
US6746916B2Jun 8, 2004
Method for forming a multilayer electrode for a ferroelectric capacitor
MICRON TECHNOLOGY INC48 citations96
US6744093B2Jun 1, 2004
Multilayer electrode for a ferroelectric capacitor
MICRON TECHNOLOGY INC42 citations96
US6617250B2Sep 9, 2003
Methods of depositing a layer comprising tungsten and methods of forming a transistor gate line
MICRON TECHNOLOGY INC38 citations96
US6608343B2Aug 19, 2003
Rough (high surface area) electrode from Ti and TiN, capacitors and semiconductor devices including same
MICRON TECHNOLOGY INC41 citations96
US6596636B2Jul 22, 2003
ALD method to improve surface coverage
MICRON TECHNOLOGY INC66 citations96
US6559472B2May 6, 2003
Film composition
MICRON TECHNOLOGY INC62 citations96
US6511896B2Jan 28, 2003
Method of etching a substantially amorphous TA2O5 comprising layer
MICRON TECHNOLOGY INC48 citations96
US6399982B1Jun 4, 2002
Rough (high surface area) electrode from Ti and TiN capacitors and semiconductor devices including same
MICRON TECHNOLOGY INC54 citations96
US6238994B1May 29, 2001
Method of creating a rough electrode (high surface area) from Ti and TiN and resulting article
MICRON TECHNOLOGY INC47 citations96
US6201276B1Mar 13, 2001
Method of fabricating semiconductor devices utilizing in situ passivation of dielectric thin films
MICRON TECHNOLOGY INC62 citations96
US6156638ADec 5, 2000
Integrated circuitry and method of restricting diffusion from one material to another
MICRON TECHNOLOGY INC53 citations96
US5773363AJun 30, 1998
Semiconductor processing method of making electrical contact to a node
MICRON TECHNOLOGY INC60 citations96
US6451692B1Sep 17, 2002
Preheating of chemical vapor deposition precursors
MICRON TECHNOLOGY INC69 citations95
US7560793B2Jul 14, 2009
Atomic layer deposition and conversion
MICRON TECHNOLOGY INC27 citations93
US7410898B2Aug 12, 2008
Methods of fabricating interconnects for semiconductor components
MICRON TECHNOLOGY INC12 citations93
US7311942B2Dec 25, 2007
Method for binding halide-based contaminants during formation of a titanium-based film
MICRON TECHNOLOGY INC11 citations93
US7279396B2Oct 9, 2007
Methods of forming trench isolation regions with nitride liner
MICRON TECHNOLOGY INC35 citations93
US7164165B2Jan 16, 2007
MIS capacitor
MICRON TECHNOLOGY INC15 citations93
US7071098B2Jul 4, 2006
Methods of fabricating interconnects for semiconductor components including a through hole entirely through the component and forming a metal nitride including separate precursor cycles
MICRON TECHNOLOGY INC20 citations93
US7029985B2Apr 18, 2006
Method of forming MIS capacitor
MICRON TECHNOLOGY INC28 citations93
US6969677B2Nov 29, 2005
Methods of forming conductive metal silicides by reaction of metal with silicon
MICRON TECHNOLOGY INC20 citations93
US6943106B1Sep 13, 2005
Methods of fabricating interconnects for semiconductor components including plating solder-wetting material and solder filling
MICRON TECHNOLOGY INC22 citations93
US6861094B2Mar 1, 2005
Methods for forming thin layers of materials on micro-device workpieces
MICRON TECHNOLOGY INC43 citations93
US6818249B2Nov 16, 2004
Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces
MICRON TECHNOLOGY INC26 citations93
US6787185B2Sep 7, 2004
Deposition methods for improved delivery of metastable species
MICRON TECHNOLOGY INC36 citations93
US6365486B1Apr 2, 2002
Method of fabricating semiconductor devices utilizing in situ passivation of dielectric thin films
MICRON TECHNOLOGY INC16 citations93
Showing the top 50 of 156 patents by PatentIndex Score.