P

Inventor

SANDHU GURTEJ S

US1,118 patents
⚠️ This page may combine multiple inventors who share the name “SANDHU GURTEJ S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MICRON TECHNOLOGY INC

47 patents
US8021897B2Sep 20, 2011

Methods of fabricating a cross point memory array

MICRON TECHNOLOGY INC147 citations99
US7199005B2Apr 3, 2007

Methods of forming pluralities of capacitors

MICRON TECHNOLOGY INC129 citations99
US7052972B2May 30, 2006

Method for forming sublithographic features during the manufacture of a semiconductor device and a resulting in-process apparatus

MICRON TECHNOLOGY INC217 citations99
US7026835B2Apr 11, 2006

Engagement probe having a grouping of projecting apexes for engaging a conductive pad

MICRON TECHNOLOGY INC109 citations99
US6939817B2Sep 6, 2005

Removal of carbon from an insulative layer using ozone

MICRON TECHNOLOGY INC526 citations99
US6890596B2May 10, 2005

Deposition methods

MICRON TECHNOLOGY INC418 citations99
US6683005B2Jan 27, 2004

Method of forming capacitor constructions

MICRON TECHNOLOGY INC92 citations99
US6653733B1Nov 25, 2003

Conductors in semiconductor devices

MICRON TECHNOLOGY INC88 citations99
US6573199B2Jun 3, 2003

Methods of treating dielectric materials with oxygen, and methods of forming capacitor constructions

MICRON TECHNOLOGY INC88 citations99
US6524867B2Feb 25, 2003

Method for forming platinum-rhodium stack as an oxygen barrier

MICRON TECHNOLOGY INC121 citations99
US6518610B2Feb 11, 2003

Rhodium-rich oxygen barriers

MICRON TECHNOLOGY INC104 citations99
US6499425B1Dec 31, 2002

Quasi-remote plasma processing method and apparatus

MICRON TECHNOLOGY INC326 citations99
US6458416B1Oct 1, 2002

Deposition methods

MICRON TECHNOLOGY INC107 citations99
US6420230B1Jul 16, 2002

Capacitor fabrication methods and capacitor constructions

MICRON TECHNOLOGY INC138 citations99
US6376284B1Apr 23, 2002

Method of fabricating a memory device

MICRON TECHNOLOGY INC365 citations99
US6369431B1Apr 9, 2002

Method for forming conductors in semiconductor devices

MICRON TECHNOLOGY INC91 citations99
US6338667B2Jan 15, 2002

System for real-time control of semiconductor wafer polishing

MICRON TECHNOLOGY INC101 citations99
US6313035B1Nov 6, 2001

Chemical vapor deposition using organometallic precursors

MICRON TECHNOLOGY INC238 citations99
US6300219B1Oct 9, 2001

Method of forming trench isolation regions

MICRON TECHNOLOGY INC167 citations99
US6281072B1Aug 28, 2001

Multiple step methods for forming conformal layers

MICRON TECHNOLOGY INC227 citations99
US6281142B1Aug 28, 2001

Dielectric cure for reducing oxygen vacancies

MICRON TECHNOLOGY INC124 citations99
US6261151B1Jul 17, 2001

System for real-time control of semiconductor wafer polishing

MICRON TECHNOLOGY INC138 citations99
US6218288B1Apr 17, 2001

Multiple step methods for forming conformal layers

MICRON TECHNOLOGY INC542 citations99
US6188097B1Feb 13, 2001

Rough electrode (high surface area) from Ti and TiN

MICRON TECHNOLOGY INC90 citations99
US6165834ADec 26, 2000

Method of forming capacitors, method of processing dielectric layers, method of forming a DRAM cell

MICRON TECHNOLOGY INC199 citations99
US6025220AFeb 15, 2000

Method of forming a polysilicon diode and devices incorporating such diode

MICRON TECHNOLOGY INC399 citations99
US5955758ASep 21, 1999

Method of forming a capacitor plate and a capacitor incorporating same

MICRON TECHNOLOGY INC123 citations99
US5888906AMar 30, 1999

Plasmaless dry contact cleaning method using interhalogen compounds

MICRON TECHNOLOGY INC292 citations99
US5851135ADec 22, 1998

System for real-time control of semiconductor wafer polishing

MICRON TECHNOLOGY INC238 citations99
US5842909ADec 1, 1998

System for real-time control of semiconductor wafer polishing including heater

MICRON TECHNOLOGY INC98 citations99
US5837564ANov 17, 1998

Method for optimal crystallization to obtain high electrical performance from chalcogenides

MICRON TECHNOLOGY INC385 citations99
US5814852ASep 29, 1998

Method of forming a Ta2 O5 dielectric layer, method of forming a capacitor having a Ta2 O5 dielectric layer, and capacitor construction

MICRON TECHNOLOGY INC95 citations99
US5762537AJun 9, 1998

System for real-time control of semiconductor wafer polishing including heater

MICRON TECHNOLOGY INC133 citations99
US5754390AMay 19, 1998

Integrated capacitor bottom electrode for use with conformal dielectric

MICRON TECHNOLOGY INC392 citations99
US5735960AApr 7, 1998

Apparatus and method to increase gas residence time in a reactor

MICRON TECHNOLOGY INC119 citations99
US5730642AMar 24, 1998

System for real-time control of semiconductor wafer polishing including optical montoring

MICRON TECHNOLOGY INC424 citations99
US5700180ADec 23, 1997

System for real-time control of semiconductor wafer polishing

MICRON TECHNOLOGY INC223 citations99
US5663088ASep 2, 1997

Method of forming a Ta2 O5 dielectric layer with amorphous diffusion barrier layer and method of forming a capacitor having a Ta2 O5 dielectric layer and amorphous diffusion barrier layer

MICRON TECHNOLOGY INC120 citations99
US5658183AAug 19, 1997

System for real-time control of semiconductor wafer polishing including optical monitoring

MICRON TECHNOLOGY INC451 citations99
US5654222AAug 5, 1997

Method for forming a capacitor with electrically interconnected construction

MICRON TECHNOLOGY INC195 citations99
US5643060AJul 1, 1997

System for real-time control of semiconductor wafer polishing including heater

MICRON TECHNOLOGY INC193 citations99
US5641545AJun 24, 1997

Method to deposit highly conformal CVD films

MICRON TECHNOLOGY INC127 citations99
US5618447AApr 8, 1997

Polishing pad counter meter and method for real-time control of the polishing rate in chemical-mechanical polishing of semiconductor wafers

MICRON TECHNOLOGY INC174 citations99
US5523697AJun 4, 1996

Testing apparatus for engaging electrically conductive test pads on a semiconductor substrate having integrated circuitry for operability testing thereof

MICRON TECHNOLOGY INC129 citations99
US5506166AApr 9, 1996

Method for forming capacitor compatible with high dielectric constant materials having a low contact resistance layer

MICRON TECHNOLOGY INC260 citations99
US5486129AJan 23, 1996

System and method for real-time control of semiconductor a wafer polishing, and a polishing head

MICRON TECHNOLOGY INC491 citations99
US5433794AJul 18, 1995

Spacers used to form isolation trenches with improved corners

MICRON TECHNOLOGY INC109 citations99

MICRON SEMICONDUCTOR INC

3 patents

Showing the top 50 of 1,118 patents by PatentIndex Score.