Inventor
TAM MELISSA M
US4 patents
Patents
4 patentsUS7745328B2Jun 29, 2010
Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD)
APPLIED MATERIALS INC12 citations92
US6838393B2Jan 4, 2005
Method for producing semiconductor including forming a layer containing at least silicon carbide and forming a second layer containing at least silicon oxygen carbide
APPLIED MATERIALS INC24 citations92
US7465659B2Dec 16, 2008
Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD)
APPLIED MATERIALS INC8 citations73
US7157384B2Jan 2, 2007
Low dielectric (low k) barrier films with oxygen doping by plasma-enhanced chemical vapor deposition (PECVD)
APPLIED MATERIALS INC7 citations73