Inventor
GRAETSCH FALK
DE9 patents
⚠️ This page may combine multiple inventors who share the name “GRAETSCH FALK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
5 patentsUS6723663B1Apr 20, 2004
Technique for forming an oxide/nitride layer stack by controlling the nitrogen ion concentration in a nitridation plasma
ADVANCED MICRO DEVICES INC26 citations92
US6875676B2Apr 5, 2005
Methods for producing a highly doped electrode for a field effect transistor
ADVANCED MICRO DEVICES INC8 citations73
US6812159B2Nov 2, 2004
Method of forming a low leakage dielectric layer providing an increased capacitive coupling
ADVANCED MICRO DEVICES INC8 citations73
US6703278B2Mar 9, 2004
Method of forming layers of oxide on a surface of a substrate
ADVANCED MICRO DEVICES INC7 citations73
US6900111B2May 31, 2005
Method of forming a thin oxide layer having improved reliability on a semiconductor surface
ADVANCED MICRO DEVICES INC0 citations51
BEYER SVEN
2 patentsUS8283232B2Oct 9, 2012
Enhanced etch stop capability during patterning of silicon nitride including layer stacks by providing a chemically formed oxide layer during semiconductor processing
BEYER SVEN7 citations83
US8951901B2Feb 10, 2015
Superior integrity of a high-K gate stack by forming a controlled undercut on the basis of a wet chemistry
BEYER SVEN2 citations61