Inventor
UTSUMI YOSHIYUKI
JP77 patents
⚠️ This page may combine multiple inventors who share the name “UTSUMI YOSHIYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
25 patentsUS7713679B2May 11, 2010
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD57 citations98
US9244347B2Jan 26, 2016
Resist composition, compound, polymeric compound and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD19 citations92
US9017924B2Apr 28, 2015
Resist composition, method of forming resist pattern, polymeric compound and compound
TOKYO OHKA KOGYO CO LTD24 citations92
US7682772B2Mar 23, 2010
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD20 citations92
US8795948B2Aug 5, 2014
Resist composition, method of forming resist pattern and polymeric compound
TOKYO OHKA KOGYO CO LTD12 citations83
US8685620B2Apr 1, 2014
Resist composition, method of forming resist pattern and polymeric compound
TOKYO OHKA KOGYO CO LTD8 citations83
US9644110B2May 9, 2017
Method of producing structure containing phase-separated structure and method of forming top coat film
TOKYO OHKA KOGYO CO LTD2 citations73
US9567477B2Feb 14, 2017
Undercoat agent and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD4 citations73
US9354515B2May 31, 2016
Resist composition, acid generator, polymeric compound and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD5 citations73
US9164379B2Oct 20, 2015
Resist composition, method for forming resist pattern, and compound
TOKYO OHKA KOGYO CO LTD6 citations73
US9164380B2Oct 20, 2015
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD5 citations72
US9366960B2Jun 14, 2016
Negative resist composition, method of forming resist pattern, and complex
TOKYO OHKA KOGYO CO LTD2 citations63
US7799507B2Sep 21, 2010
Positive resist composition for immersion lithography and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD6 citations63
US9442371B2Sep 13, 2016
Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US9206307B2Dec 8, 2015
Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD2 citations62
US9063416B2Jun 23, 2015
Resist composition, method of forming resist pattern and compound
TOKYO OHKA KOGYO CO LTD3 citations62
US8900795B2Dec 2, 2014
Resist composition, method of forming resist pattern and novel compound
TOKYO OHKA KOGYO CO LTD2 citations62
US8778595B2Jul 15, 2014
Resist composition, method of forming resist pattern, and polymeric compound
TOKYO OHKA KOGYO CO LTD2 citations62
US7955777B2Jun 7, 2011
Compound, acid generator, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations62
US9091916B2Jul 28, 2015
Positive-type photoresist composition, photoresist laminate, method for producing photoresist pattern, and method for producing connecting terminal
TOKYO OHKA KOGYO CO LTD2 citations61
US8367297B2Feb 5, 2013
Resist composition, method of forming resist pattern, novel compound and acid generator
TOKYO OHKA KOGYO CO LTD3 citations60
US9499646B2Nov 22, 2016
Negative resist composition, method of forming resist pattern and complex
TOKYO OHKA KOGYO CO LTD1 citations52
US9469712B2Oct 18, 2016
Method of producing polymeric compound, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations52
US9383642B2Jul 5, 2016
Polymerization method of high-molecular weight compound, resist composition, and method for forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations52
US9188869B2Nov 17, 2015
Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern
TOKYO OHKA KOGYO CO LTD1 citations52
UTSUMI YOSHIYUKI
8 patentsUS8765354B2Jul 1, 2014
Resist composition for negative development and method of forming resist pattern
UTSUMI YOSHIYUKI7 citations84
US8415082B2Apr 9, 2013
Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator
UTSUMI YOSHIYUKI8 citations84
US8765352B2Jul 1, 2014
Resist composition, method of forming resist pattern, novel compound, and acid generator
UTSUMI YOSHIYUKI4 citations73
US8987386B2Mar 24, 2015
Method of producing polymeric compound, resist composition, and method of forming resist pattern
UTSUMI YOSHIYUKI5 citations72
US8846291B2Sep 30, 2014
Resist composition, method of forming resist pattern, and new compound
UTSUMI YOSHIYUKI5 citations71
US8268530B2Sep 18, 2012
Positive resist composition, method of forming resist pattern, polymeric compound, and compound
UTSUMI YOSHIYUKI2 citations62
US8247160B2Aug 21, 2012
Resist composition, method of forming resist pattern, and novel compound and acid generator
UTSUMI YOSHIYUKI2 citations62
US8105747B2Jan 31, 2012
Positive resist composition and method of forming resist pattern
UTSUMI YOSHIYUKI4 citations62
KAWAUE AKIYA
6 patentsUS8338076B2Dec 25, 2012
Resist composition, method of forming resist pattern, novel compound, and acid generator
KAWAUE AKIYA7 citations83
US9023581B2May 5, 2015
Resist composition, method of forming resist pattern, polymeric compound, and compound
KAWAUE AKIYA8 citations81
US8703387B2Apr 22, 2014
Resist composition, method of forming resist pattern, novel compound, and acid generator
KAWAUE AKIYA2 citations62
US8252505B2Aug 28, 2012
Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern
KAWAUE AKIYA4 citations62
US8206890B2Jun 26, 2012
Resist composition, method of forming resist pattern, compound and acid generator
KAWAUE AKIYA2 citations61
US8227169B2Jul 24, 2012
Compound, acid generator, resist composition, and method of forming resist pattern
KAWAUE AKIYA2 citations60
SESHIMO TAKEHIRO
4 patentsUS8206891B2Jun 26, 2012
Positive resist composition and method of forming resist pattern
SESHIMO TAKEHIRO10 citations83
US8124313B2Feb 28, 2012
Resist composition, method of forming resist pattern, novel compound, and acid generator
SESHIMO TAKEHIRO11 citations83
US8298748B2Oct 30, 2012
Positive resist composition, method of forming resist pattern, and polymeric compound
SESHIMO TAKEHIRO2 citations60
US8932795B2Jan 13, 2015
Resist composition, method of forming resist pattern, novel compound, and acid generator
SESHIMO TAKEHIRO2 citations58
MITSUBISHI ELECTRIC CORP
2 patentsHADA HIDEO
2 patentsSAN APRO LTD
1 patentKOMURO YOSHITAKA
1 patentTOYO GOSEI CO LTD
1 patentShowing the top 50 of 77 patents by PatentIndex Score.