Inventor
KAWAUE AKIYA
JP43 patents
⚠️ This page may combine multiple inventors who share the name “KAWAUE AKIYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO OHKA KOGYO CO LTD
27 patentsUS7713679B2May 11, 2010
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD57 citations98
US9244347B2Jan 26, 2016
Resist composition, compound, polymeric compound and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD19 citations92
US7682772B2Mar 23, 2010
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD20 citations92
US9052592B2Jun 9, 2015
Resist composition and resist pattern forming method
TOKYO OHKA KOGYO CO LTD16 citations83
US7927780B2Apr 19, 2011
Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator
TOKYO OHKA KOGYO CO LTD9 citations83
US7776510B2Aug 17, 2010
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD14 citations83
US7488568B2Feb 10, 2009
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD7 citations73
US9164380B2Oct 20, 2015
Resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD5 citations72
US7745097B2Jun 29, 2010
Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations63
US10995234B2May 4, 2021
Method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations62
US9063416B2Jun 23, 2015
Resist composition, method of forming resist pattern and compound
TOKYO OHKA KOGYO CO LTD3 citations62
US9040224B2May 26, 2015
Resist composition, method of forming resist pattern and compound
TOKYO OHKA KOGYO CO LTD3 citations62
US7955777B2Jun 7, 2011
Compound, acid generator, resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD4 citations62
US11022880B2Jun 1, 2021
Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and mercapto compound
TOKYO OHKA KOGYO CO LTD1 citations60
US8367297B2Feb 5, 2013
Resist composition, method of forming resist pattern, novel compound and acid generator
TOKYO OHKA KOGYO CO LTD3 citations60
US10676636B2Jun 9, 2020
Brush composition, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations52
US9012129B2Apr 21, 2015
Resist composition, method of forming resist pattern, novel compound, and acid generator
TOKYO OHKA KOGYO CO LTD0 citations52
US9914847B2Mar 13, 2018
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations51
US8367299B2Feb 5, 2013
Resist composition, method of forming resist pattern, compound and acid generator
TOKYO OHKA KOGYO CO LTD1 citations51
US11474432B2Oct 18, 2022
Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compound
TOKYO OHKA KOGYO CO LTD0 citations50
US11131927B2Sep 28, 2021
Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article
TOKYO OHKA KOGYO CO LTD0 citations49
US11061326B2Jul 13, 2021
Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound
TOKYO OHKA KOGYO CO LTD0 citations49
US10100134B2Oct 16, 2018
Method for manufacturing polymer compound
TOKYO OHKA KOGYO CO LTD0 citations42
US9776208B2Oct 3, 2017
Brush composition, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations41
US10179866B2Jan 15, 2019
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations40
US9828519B2Nov 28, 2017
Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure
TOKYO OHKA KOGYO CO LTD0 citations40
US7914968B2Mar 29, 2011
Positive resist composition and method of forming resist pattern
TOKYO OHKA KOGYO CO LTD0 citations40
KAWAUE AKIYA
7 patentsUS8338076B2Dec 25, 2012
Resist composition, method of forming resist pattern, novel compound, and acid generator
KAWAUE AKIYA7 citations83
US9023581B2May 5, 2015
Resist composition, method of forming resist pattern, polymeric compound, and compound
KAWAUE AKIYA8 citations81
US8703387B2Apr 22, 2014
Resist composition, method of forming resist pattern, novel compound, and acid generator
KAWAUE AKIYA2 citations62
US8252505B2Aug 28, 2012
Compound and method of producing same, acid generator, resist composition, and method of forming resist pattern
KAWAUE AKIYA4 citations62
US8206890B2Jun 26, 2012
Resist composition, method of forming resist pattern, compound and acid generator
KAWAUE AKIYA2 citations61
US8227169B2Jul 24, 2012
Compound, acid generator, resist composition, and method of forming resist pattern
KAWAUE AKIYA2 citations60
US8541157B2Sep 24, 2013
Resist composition, method of forming resist pattern, compound and acid generator including the same
KAWAUE AKIYA0 citations51
UTSUMI YOSHIYUKI
3 patentsUS8846291B2Sep 30, 2014
Resist composition, method of forming resist pattern, and new compound
UTSUMI YOSHIYUKI5 citations71
US8247160B2Aug 21, 2012
Resist composition, method of forming resist pattern, and novel compound and acid generator
UTSUMI YOSHIYUKI2 citations62
US9017919B2Apr 28, 2015
Resist composition, method of forming resist pattern, novel compound and acid generator
UTSUMI YOSHIYUKI0 citations51