Inventor

CHEON HWAN-SUNG

KR51 patents

⚠️ This page may combine multiple inventors who share the name “CHEON HWAN-SUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHEON HWAN-SUNG

CHEIL IND INC

Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same

Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition

Photosensitive resin composition and color filter prepared using the same

Photosensitive resin composition and light blocking layer using the same

Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device

Flame retardant thermoplastic copolymer, method for preparing the same, and molded article including the same

Photosensitive resin composition for color filter, and color filter prepared using the same

Photosensitive resin composition for light blocking layer and light blocking layer using the same

Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device including the pattern

Positive photosensitive resin composition, and organic insulator film for display device and display device fabricated using the same

Photosensitive resin composition and light blocking layer using the same

Photosensitive resin composition and black spacer using the same

SAMSUNG SDI CO LTD

Adhesive film and display member using same

Compound containing phosphonium ion, epoxy resin composition containing same, and device manufactured by using same

Pyridiniuivi-based compound, epoxy resin composition comprising same, and apparatus manufactured using same

Curing catalyst for epoxy resin composition, epoxy resin composition comprising same, and apparatus manufactured by using same

Photosensitive resin composition and color filter using the same

Adhesive composition for polarizing plate, polarizing plate including the same, and optical display including the same

KWON JI-YUN

Positive photosensitive resin composition, and photosensitive resin layer and display device using the same

Photosensitive resin composition and color filter using the same

Positive photosensitive resin composition

Photosensitive resin composition and color filter using the same

JEONG JI-YOUNG

Positive photosensitive resin composition

Phenol compounds and positive photosensitive resin composition including the same

Positive photosensitive resin composition, photosensitive resin layer prepared by using the same, and semiconductor device including the photosensitive resin layer

SONG JEE-YUN

Hardmask composition including aromatic ring-containing compound, method of forming patterns, and semiconductor integrated circuit device including the patterns

Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same

KIM MIN-SOO

Hard mask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern

Aromatic ring-containing polymer for underlayer of resist and resist underlayer composition including the same

CHO SUNG-WOOK

Aromatic ring-containing compound for a resist underlayer and resist underlayer composition

Aromatic ring-containing polymer for resist underlayer, resist underlayer composition including the same, and method of patterning device using the same

LG CHEMICAL LTD

Process for preparation of 2-aminothiazolecarboxamide derivatives

Process for preparation of 2-aminothiazolecarboxamide derivatives

KIM MIN GYUM

Quaternary phosphonium salt, epoxy resin composition for encapsulating semiconductor device and including the quaternary phosphonium salt, and semiconductor device encapsulated with the epoxy resin composition

Epoxy resin composition for encapsulating semiconductor device and semiconductor device encapsulated using the same

YOON KYONG HO

Hardmask composition having antireflective properties and method of patterning material on substrate using the same

KIM MIN SOO

Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods

CHEON HWAN SUNG

Polymer composition, hardmask composition having antireflective properties, and associated methods

OH SEUNG-BAE

Hardmask composition, method of forming a pattern using the same, and semiconductor integrated circuit device including the pattern

LEE CHANG-MIN

Photosensitive resin composition for color filter and color filter including the same

LEE KIL-SUNG

Image sensor and method for manufacturing the same

LEE JEONG-WOO

Positive type photosensitive resin composition

LEE JONG-HWA

Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film

YOON KYONG-HO

Aromatic ring containing polymer, underlayer composition including the same, and associated methods

CHO HYUN-YONG

Positive photosensitive resin composition

KWON HYO-YOUNG

Resist underlayer composition, method of forming patterns and semiconductor integrated circuit device including the patterns

CHUNG MIN-KOOK

Ortho-nitrobenzyl ester compound and positive type photosensitive resin composition including the same

MOON KYUNG-SOO

Photosensitive resin composition for color filter and color filter using the same

LEE SUNG-JAE

Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

KIM JAE-HYUN

Photosensitive resin composition for color filter and color filter using the same