Inventor
KUSUNOSE HARUHIKO
JP28 patents
⚠️ This page may combine multiple inventors who share the name “KUSUNOSE HARUHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LASERTEC CORP
21 patentsUS6858859B2Feb 22, 2005
Optically scanning apparatus and defect inspection system
LASERTEC CORP62 citations96
US6195202B1Feb 27, 2001
Laser microscope and a pattern inspection apparatus using such laser microscope
LASERTEC CORP55 citations96
US6043932AMar 28, 2000
Laser microscope and a pattern inspection apparatus using such laser microscope
LASERTEC CORP77 citations96
US5771097AJun 23, 1998
Mach-zehnder type interferometer
LASERTEC CORP20 citations88
US7907270B2Mar 15, 2011
Inspection apparatus and method, and production method for pattern substrates
LASERTEC CORP9 citations84
US6665326B2Dec 16, 2003
Light source device
LASERTEC CORP19 citations84
US6654110B2Nov 25, 2003
Image pickup apparatus and defect inspection apparatus for photomask
LASERTEC CORP14 citations84
US7643157B2Jan 5, 2010
Phase shift amount measurement apparatus and transmittance measurement apparatus
LASERTEC CORP8 citations83
US9719859B2Aug 1, 2017
Interferometer and phase shift amount measuring apparatus with diffraction gratings to produce two diffraction beams
LASERTEC CORP3 citations73
US9117869B2Aug 25, 2015
Chucking device and chucking method
LASERTEC CORP4 citations73
US9588421B2Mar 7, 2017
Pellicle inspection apparatus
LASERTEC CORP6 citations71
US9638739B2May 2, 2017
Defect coordinates measurement device, defect coordinates measurement method, mask manufacturing method, and reference mask
LASERTEC CORP2 citations70
US10645289B2May 5, 2020
Optical apparatus and vibration removing method
LASERTEC CORP1 citations62
US7764414B2Jul 27, 2010
Illumination apparatus and illumination method
LASERTEC CORP2 citations62
US7548309B2Jun 16, 2009
Inspection apparatus, inspection method, and manufacturing method of pattern substrate
LASERTEC CORP2 citations61
US12050184B2Jul 30, 2024
Mask inspection method and mask inspection apparatus
LASERTEC CORP0 citations59
US7796343B2Sep 14, 2010
Photomask inspection apparatus
LASERTEC CORP2 citations59
US11353802B2Jun 7, 2022
Optical device, and method for preventing contamination of optical device
LASERTEC CORP0 citations58
US10712287B2Jul 14, 2020
Inspection device and inspection method
LASERTEC CORP1 citations58
US9013787B2Apr 21, 2015
Microscope and inspection apparatus
LASERTEC CORP2 citations57
US10706527B2Jul 7, 2020
Correction method, correction apparatus, and inspection apparatus
LASERTEC CORP1 citations56
MITSUBISHI ELECTRIC CORP
4 patentsUS5426503AJun 20, 1995
Method of testing a phase shift mask and a testing apparatus used therein in the ultraviolet wavelength range
MITSUBISHI ELECTRIC CORP25 citations92
US5772842AJun 30, 1998
Apparatus for stripping pellicle
MITSUBISHI ELECTRIC CORP33 citations91
US5428203AJun 27, 1995
Electron beam exposing apparatus with a stencil mask kept at a constant temperature
MITSUBISHI ELECTRIC CORP17 citations74
US5275895AJan 4, 1994
Method of manufacturing phase-shifting mask
MITSUBISHI ELECTRIC CORP7 citations74