Inventor
ISAWA MIKI
JP11 patents
⚠️ This page may combine multiple inventors who share the name “ISAWA MIKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
10 patentsUS8648300B2Feb 11, 2014
Charged particle beam apparatus
HITACHI HIGH TECH CORP7 citations83
US9472376B2Oct 18, 2016
Scanning electron microscope
HITACHI HIGH TECH CORP4 citations72
US10545018B2Jan 28, 2020
Pattern measurement device, and computer program for measuring pattern
HITACHI HIGH TECH CORP1 citations59
US10732512B2Aug 4, 2020
Image processor, method for generating pattern using self-organizing lithographic techniques and computer program
HITACHI HIGH TECH CORP0 citations51
US9589343B2Mar 7, 2017
Pattern measurement device, evaluation method of polymer compounds used in self-assembly lithography, and computer program
HITACHI HIGH TECH CORP0 citations51
US9502212B2Nov 22, 2016
Charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations51
US10854420B2Dec 1, 2020
Pattern evaluation device
HITACHI HIGH TECH CORP0 citations48
US9831062B2Nov 28, 2017
Method for pattern measurement, method for setting device parameters of charged particle radiation device, and charged particle radiation device
HITACHI HIGH TECH CORP0 citations41
US9627171B2Apr 18, 2017
Charged particle beam device
HITACHI HIGH TECH CORP0 citations41
US9804107B2Oct 31, 2017
Pattern measurement device and computer program for evaluating patterns based on centroids of the patterns
HITACHI HIGH TECH CORP0 citations36