Inventor
SHI RUI-FANG
US36 patents
⚠️ This page may combine multiple inventors who share the name “SHI RUI-FANG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
23 patentsUS7995832B2Aug 9, 2011
Photomask inspection and verification by lithography image reconstruction using imaging pupil filters
KLA TENCOR CORP36 citations92
US9547892B2Jan 17, 2017
Apparatus and methods for predicting wafer-level defect printability
KLA TENCOR CORP7 citations84
US9478019B2Oct 25, 2016
Reticle inspection using near-field recovery
KLA TENCOR CORP7 citations84
US7962863B2Jun 14, 2011
Computer-implemented methods, systems, and computer-readable media for determining a model for predicting printability of reticle features on a wafer
KLA TENCOR CORP19 citations84
US10634623B2Apr 28, 2020
Phase contrast monitoring for extreme ultra-violet (EUV) masks defect inspection
KLA TENCOR CORP5 citations73
US11257207B2Feb 22, 2022
Inspection of reticles using machine learning
KLA TENCOR CORP4 citations71
US11112691B2Sep 7, 2021
Inspection system with non-circular pupil
KLA TENCOR CORP2 citations69
US9863761B2Jan 9, 2018
Critical dimension uniformity monitoring for extreme ultraviolet reticles
KLA TENCOR CORP5 citations69
US10168273B1Jan 1, 2019
Methods and apparatus for polarizing reticle inspection
KLA TENCOR CORP5 citations68
US10304180B2May 28, 2019
Apparatus and methods for predicting wafer-level defect printability
KLA TENCOR CORP1 citations62
US12094101B2Sep 17, 2024
Inspection of reticles using machine learning
KLA TENCOR CORP0 citations61
US7546573B1Jun 9, 2009
Semiconductor device pattern generation
KLA TENCOR CORP3 citations61
US6704103B2Mar 9, 2004
Coatings for sensitivity enhancement of signal from glass disks
KLA TENCOR CORP3 citations61
US9612541B2Apr 4, 2017
Qualifying patterns for microlithography
KLA TENCOR CORP1 citations52
US9778207B2Oct 3, 2017
Integrated multi-pass inspection
KLA TENCOR CORP1 citations51
US9092847B2Jul 28, 2015
Detection of thin lines for selective sensitivity during reticle inspection using processed images
KLA TENCOR CORP0 citations51
US10539512B2Jan 21, 2020
Block-to-block reticle inspection
KLA TENCOR CORP0 citations48
US10288415B2May 14, 2019
Critical dimension uniformity monitoring for extreme ultra-violet reticles
KLA TENCOR CORP0 citations48
US9766185B2Sep 19, 2017
Block-to-block reticle inspection
KLA TENCOR CORP1 citations48
US10140698B2Nov 27, 2018
Polygon-based geometry classification for semiconductor mask inspection
KLA TENCOR CORP1 citations47
US9733640B2Aug 15, 2017
Method and apparatus for database-assisted requalification reticle inspection
KLA TENCOR CORP1 citations45
US9417191B2Aug 16, 2016
Using reflected and transmission maps to detect reticle degradation
KLA TENCOR CORP0 citations40
US10401305B2Sep 3, 2019
Time-varying intensity map generation for reticles
KLA TENCOR CORP0 citations39
KLA CORP
8 patentsUS12133318B2Oct 29, 2024
Rotating target for extreme ultraviolet source with liquid metal
KLA CORP1 citations62
US11733605B2Aug 22, 2023
EUV in-situ linearity calibration for TDI image sensors using test photomasks
KLA CORP1 citations61
US11442021B2Sep 13, 2022
Broadband light interferometry for focal-map generation in photomask inspection
KLA CORP0 citations59
US12092814B2Sep 17, 2024
Correcting aberration and apodization of an optical system using correction plates
KLA CORP0 citations57
US11469571B2Oct 11, 2022
Fast phase-shift interferometry by laser frequency shift
KLA CORP0 citations51
US11333487B2May 17, 2022
Common path mode fiber tip diffraction interferometer for wavefront measurement
KLA CORP0 citations46
US12360058B2Jul 15, 2025
Integration of an optical height sensor in mask inspection tools
KLA CORP0 citations42
US12529954B2Jan 20, 2026
In-situ in-band and out-of-band spectral measurement for EUV tools
KLA CORP0 citations40